Pattern-data preparation method to enchance high-throughput mask fabrication in variable-shaped e-beam writing system
- Author(s):
Hara,S. ( Toshiba Corp. ) Murakami,E. Magoshi,S. Koyama,K. Anze,H. Ogawa,Y. Kabeya,A. Ooki,S. Saito,T. Fujii,T. Sakamoto,S. Suzuki,H. Yano,M. Watanabe,S. - Publication title:
- Photomask and X-Ray Mask Technology III
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2793
- Pub. Year:
- 1996
- Page(from):
- 410
- Page(to):
- 417
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819421791 [0819421790]
- Language:
- English
- Call no.:
- P63600/2793
- Type:
- Conference Proceedings
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