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Feature level test patterns for characterizing residual process effects

Author(s):
Neureuther, A.R. ( Univ. of California/Berkeley (USA) )
McIntyre, G.R. ( Univ. of California/Berkeley (USA) )
Gennari, F.E. ( Univ. of California/Berkeley (USA) )
Lam, M. ( Univ. of California/Berkeley (USA) )
Cain, J.P. ( Univ. of California/Berkeley (USA) )
Robins, G.C. ( Univ. of California/Berkeley (USA) )
Huang, E. ( Univ. of California/Berkeley (USA) )
Choi, J. ( Univ. of California/Berkeley (USA) )
Wang, L. ( Univ. of California/Berkeley (USA) )
Yuan, L. ( Univ. of California/Berkeley (USA) )
Oshima, H. ( Univ. of California/Berkeley (USA) )
6 more
Publication title:
Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5379
Pub. Year:
2004
Page(from):
76
Page(to):
84
Pages:
9
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452924 [0819452920]
Language:
English
Call no.:
P63600/5379
Type:
Conference Proceedings

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