1.

Conference Proceedings
Conference Proceedings
1. Feasibility of printing 0.1-ｦﾌm technology with optical lithography
Maenhoudt,M. ; Verhaegen,S. ; Ronse,K. ; Flagello,D.G. ; Geh,B. ; Kaiser,W.M.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.347-357,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
2.

Conference Proceedings
Conference Proceedings
2. Limits of optical lithography
Maenhoudt,M. ; Verhaegen,S. ; Ronse,K. ; Zandbergen,P. ; Muzio,E.G.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.373-387,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
3.

Conference Proceedings
Conference Proceedings
3. Model-based OPC for first-generation 193-nm lithography
Lucas,K.D. ; Word,J.C. ; Vandenberghe,G.N. ; Verhaegen,S. ; Jonckheere,R.M.
Pub. info.: Optical Microlithography XIV.  4346  pp.119-130,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
4.

Conference Proceedings
Conference Proceedings
4. CD control for two-dimensional features in future technology nodes
Verhaegen,S. ; Gordon,R.L. ; Jonckheere,R.M. ; McCallum,M. ; Ronse,K.
Pub. info.: Optical Microlithography XIV.  4346  pp.368-378,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
5.

Conference Proceedings
Conference Proceedings
5. Reticle quality needs for advanced 193-nm lithography
Jonckheere,R.M. ; Vandenberghe,G.N. ; Wiaux,V. ; Verhaegen,S. ; Ronse,K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.108-117,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
6.

Conference Proceedings
Conference Proceedings
6. Challenge for sub-100-nm DRAM gate printing using ArF lithography with combination of moderate OAI and attPSM
Kim,Y.-C. ; Vandenberghe,G.N. ; Verhaegen,S. ; Ronse,K.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.954-967,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562