Nanometer-scale roughness analysis of Si surfaces by TM-AFM for low-temperature epitaxy

Nanometer-scale roughness analysis of Si surfaces by TM-AFM for low-temperature epitaxy

Author(s):

Publication title:

ALTECH 95 : analytical techniques for semiconductor materials and process characterization II : proceedings of the Satellite Symposium to ESSDERC 95, The Hague, The Netherlands

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

95-30

Pub. Year:

1995

Page(from):

263

Page(to):

270

Pub. info.:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566771221 [1566771226]

Language:

English

Call no.:

E23400/961027

Type:

Conference Proceedings

Details

TDL ID:	ZA00013834
Series ID:	PA00000028
Conf. info. (Name):	ALTECH ; ESSDERC
Conf. info. (Number):	1995 ; 25th (1995)
Conf. info. (Venue):	Hague, The Netherlands
Conf. info. (Date):	1995.09.24-1995.09.27

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