Liebmann, L. ; Mansfield, S. ; Han, G. ; Culp, J. ; Hibbeler, J. ; Tsai, R.
Pub. info.:
Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA. pp.61560K-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Lin, W. ; Liao, S. ; Tsai, R. ; Yeh, M. ; Hsieh, C. ; Yu, Y. ; Lin, B. S. ; Fu, S. ; Dziura, T. G.
Pub. info.:
Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA. pp.138-144, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Andricacos, P.C. ; Parks, C. ; Cabral, C. ; Wachnik, R. ; Tsai, R. ; Maihotra, S. ; Locke, P. ; Fluegel, J. ; Horkans, J. ; Kwietniak, K. ; Uzoh, C. ; Rodbell, K.P. ; Gignac, L. ; Walton, E. ; Chung, D. ; Geffren, R.
Pub. info.:
Electrochemical processing in ULSI fabrication and semiconductor/metal deposition II : proceedings of the international symposium. pp.111-121, 1999. Pennington, N.J.. Electrochemical Society
Nauka, K. ; Amano, J. ; Scott, M.P. ; Weber, E.R. ; Turner, J.E. ; Tsai, R.
Pub. info.:
Materials issues in silicon integrated circuit processing : symposium held April 15-18, 1986, Palo Alto, California, U.S.A.. pp.319-324, 1986. Pittsburgh, Pa.. Materials Research Society
Mango, R. ; Boos, J. B. ; Campbell, P. M. ; Bennet, B. R. ; Glasser, E. R. ; Tinkham, B. P. ; Ancona, M. G. ; Hobart, K. D. ; Kruppa, W. ; Ikossi, K. ; Papanicolaou, N. A. ; Park, D. ; Shanabrook, B. V. ; Mittereder, J. ; Chang, W. ; Bass, R. ; Mohney, S. E. ; Wang, S. ; Robinson, J. ; Tsai, R. ; Barsky, M. ; Lange, M. D. ; Gutierrez, A.
Pub. info.:
Proceedings of the Fourth International Symposium on Process Physics and Modeling in Semiconductor Technology. pp.191-204, 2004. Pennington, NJ. Electrochemical Society
Cohen, S. L. ; Rath, D. ; Lee, G. ; Furman, B. ; Pope, K. R. ; Tsai, R. ; Syverson, W. ; Gow, C. ; Liehr, M.
Pub. info.:
Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA. pp.13-, 1995. Pittsburgh, PA. MRS - Materials Research Society