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Barometric pressure compensation to control photoresist film thickness

Author(s):
Vishnu, V. ( IBM Corp. (USA) )
Randall, M. ( IBM Corp. (USA) )
Pillette, C.J. ( IBM Corp. (USA) )
Katayama, K. ( Tokyo Electron Kyushu, Ltd. (Japan) )
Omura, K. ( Tokyo Electron Kyushu, Ltd. (Japan) )
Uemura, R. ( Tokyo Electron Kyushu, Ltd. (Japan) )
Tomita, H. ( Tokyo Electron Kyushu, Ltd. (Japan) )
Ando, R. ( Tokyo Electron Kyushu, Ltd. (Japan) )
Ogata, K. ( Tokyo Electron Kyushu, Ltd. (Japan) )
Maejima, H. ( Tokyo Electron America, Inc. (USA) )
DiDonato, A. ( Tokyo Electron America, Inc. (USA) )
Nicholson, J. ( Tokyo Electron America, Inc. (USA) )
7 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5375
Pub. Year:
2004
Page(from):
958
Page(to):
966
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452887 [0819452882]
Language:
English
Call no.:
P63600/5375.2
Type:
Conference Proceedings

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