Effects of complementary phase-shift imaging on gate CD control
- Author(s):
Nelson-Thomas,C. ( Motorola ) Kling,M.E. Thompson,M.A. Wang,R. Cave,N. Fu,C.-C. - Publication title:
- Optical Microlithography XIV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4346
- Pub. Year:
- 2001
- Vol.:
- 4346
- Pt.:
- One of Two Parts
- Page(from):
- 464
- Page(to):
- 470
- Pages:
- 7
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440327 [0819440329]
- Language:
- English
- Call no.:
- P63600/4346
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Theoretical and experimental optimization of numerical aperture and partial coherence for complementary phase-shift processes
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
"Polarized phase shift mask: concept, design, and potential advantages to photolithography process and physical design"
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Investigation of full-field CD control of sub-100-nm gate features by phase-shift 248-nm lithography
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
3
Conference Proceedings
Development of a complementary phase-shift mask process for 90-nm node technology
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
10
Conference Proceedings
Precision control of poly-gate CD by local OPC for elimination of microloading effect on 0.13-μm CMOS technology
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
11
Conference Proceedings
Precision control of poly-gate CD by local OPC for elimination of microloading effect on 0.13-μm CMOS technology
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
12
Conference Proceedings
Pecision control of poly-gate CD by local OPC for elimination of microloading effect on 0.13-Цm CMOS technology
SPIE-The International Society for Optical Engineering |