1.

Conference Proceedings
Conference Proceedings
1. Use of Non-Contact Resistivity Measurements for Epitaxy: Surface Charge Profiler Method
Danel, A. ; Tardif, F. ; Kamarinos, G. ; Nguyen, M.C.
Pub. info.: Proceedings of the Fifth International Symposium on High Purity Silicon V.  pp.444-455,  1998.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 98-13
2.

Conference Proceedings
Conference Proceedings
2. Sensitivity of the surface charge profiler (SCP) method for some monitoring applications
Danel, A. ; Lardin, T. ; Kamarinos, G. ; Tardif, F.
Pub. info.: Proceedings of the Symposium on Crystalline Defects and Contamination, their Impact and Control in Device Manufacturing II.  pp.394-403,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-22
3.

Conference Proceedings
Conference Proceedings
3. Detection of noble metals in HF based chemistries by microwave photoconductive decay (μ-PCD)
Tardif, F. ; Joly, J.-P. ; Courteaux, A. ; Straube, U. ; Danel, A. ; Kamarinos, G.
Pub. info.: Proceedings of the Symposium on Crystalline Defects and Contamination, their Impact and Control in Device Manufacturing II.  pp.385-393,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-22
4.

Conference Proceedings
Conference Proceedings
4. HF IN SITU TANK USED IN HF-LAST CLEAMNG
Patruno, P. ; Levy, D. ; Fleury, A. ; Tonti, A. ; Tardif, F.
Pub. info.: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.195-205,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-7
5.

Conference Proceedings
Conference Proceedings
5. MECHANICAL RESISTANCE OF FINE MICROSTRUCTURES RELATED TO PARTICLE CLEANING MECHANISMS
Tardif, F. ; Raccurt, O. ; Barbe, J.C. ; De Crecy, F. ; Besson, P. ; Danel, A.
Pub. info.: Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium.  pp.153-160,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-26
6.

Conference Proceedings
Conference Proceedings
6. MONITORING OF NOBLE METALS IN HF BASED CHEMISTRIES USING μ-PCD,SPV,SCI, and SCP
Danel, A. ; Straube, U. ; Kamarinos, G. ; Kamieniecki, E. ; Tardif, F.
Pub. info.: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.400-407,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-35
7.

Conference Proceedings
Conference Proceedings
7. PROTECTION OF HF BATHS AGAINST NOBEL METAL CONTAMINATION
Kunz, S. ; Marthon, S. ; Tardif, F.
Pub. info.: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.120-127,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-35
8.

Conference Proceedings
Conference Proceedings
8. HF Last Cleaning Before Silicon Epitaxy
Patruno, P. ; Fleury, A. ; Wyborn, H. ; Andre, E. ; Tardif, F.
Pub. info.: Proceedings of the Symposium on Large Area Wafer Growth and Processing for Electronic and Photonic Devices and the twentieth State-of-the-Art Program on Compound Semiconductors (SOTAPOCS XX).  pp.93-100,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-18
9.

Conference Proceedings
Conference Proceedings
9. POST W CMP CLEANING
Constant, I. ; Marthon, S. ; Lardin, T. ; David, C. ; Jacquemond, M.N. ; Tardif, F.
Pub. info.: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.626-633,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-35
10.

Conference Proceedings
Conference Proceedings
10. EVALUATION OF ADVANCED PRE-GATE CLEANINGS
Cowache, C. ; Boelen, P. ; Kashkoush, I. ; Besson, P. ; Tardif, F.
Pub. info.: Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium.  pp.59-68,  1999.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-36