1.

Conference Proceedings
Conference Proceedings
1. HF IN SITU TANK USED IN HF-LAST CLEAMNG
Patruno, P. ; Levy, D. ; Fleury, A. ; Tonti, A. ; Tardif, F.
Pub. info.: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.195-205,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-7
2.

Conference Proceedings
Conference Proceedings
2. THE CONTROL OF DISSOLVED GASES IN AQUEOUS-BASED SEMICONDUCTOR PROCESSING
Levy, D. ; Tardif, F. ; Maunier, F. ; Pizzetti, C. ; Christenson, K.
Pub. info.: Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium.  pp.121-128,  1999.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-36
3.

Conference Proceedings
Conference Proceedings
3. CHEMICAL OXIDE CHARACTERIZATION
Paillet, C. ; Joly, J.P. ; Tardif, F. ; Barla, K. ; Patruno, P. ; Levy, D.
Pub. info.: Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.366-370,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-20
4.

Conference Proceedings
Conference Proceedings
4. IMPACT STUDY OF THE USE OF ULSI, VLSI AND MOS GRADE CHEMICALS IN THE RCA CLEANING PROCESS ON MOS AND BIPOLAR DEVICES
Tardif, F. ; Joly, J.P. ; Lardin, T. ; Tonti, A. ; Patruno, P. ; Levy, D. ; Sievert, W.
Pub. info.: Proceedings of the Satellite Symposium to ESSDERC 93 Grenoble/France : crystalline defects and contamination: their impact and control in device manufacturing.  pp.114-122,  1993.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1993-15
5.

Conference Proceedings
Conference Proceedings
5. IMPACT STUDY OF THE USE OF ULSI, VLSI AND MOS GRADE CHEMICALS IN THE RCA CLEANING PROCESS ON MOS AND BIPOLAR DEVICES
Tardif, F. ; Joly, J.P. ; Lardin, T. ; Tonti, A. ; Patruno, P. ; Levy, D. ; Sievert, W.
Pub. info.: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.85-93,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-7
6.

Conference Proceedings
Conference Proceedings
6. OPTIMIZATION OF HF AND OXIDANT WET CLEANINGS BEFORE 7nm GATE OXIDE
Tardif, F. ; Lardin, T. ; Paillet, C. ; Joly, J.P. ; Fleury, A. ; Patruno, P. ; Levy, D. ; Barla, K.
Pub. info.: Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.49-59,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-20
7.

Conference Proceedings
Conference Proceedings
7. PARTICLE IMPACT ON 7 nm GATE OXIDES
Paillet, C. ; Papon, A.M. ; Joly, J.P. ; Tardif, F. ; Levy, D. ; Barla, K. ; Patruno, P.
Pub. info.: Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.575-580,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-20