1.

Conference Proceedings
Conference Proceedings
1. Use of Non-Contact Resistivity Measurements for Epitaxy: Surface Charge Profiler Method
Danel, A. ; Tardif, F. ; Kamarinos, G. ; Nguyen, M.C.
Pub. info.: Proceedings of the Fifth International Symposium on High Purity Silicon V.  pp.444-455,  1998.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 98-13
2.

Conference Proceedings
Conference Proceedings
2. Sensitivity of the surface charge profiler (SCP) method for some monitoring applications
Danel, A. ; Lardin, T. ; Kamarinos, G. ; Tardif, F.
Pub. info.: Proceedings of the Symposium on Crystalline Defects and Contamination, their Impact and Control in Device Manufacturing II.  pp.394-403,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-22
3.

Conference Proceedings
Conference Proceedings
3. Detection of noble metals in HF based chemistries by microwave photoconductive decay (μ-PCD)
Tardif, F. ; Joly, J.-P. ; Courteaux, A. ; Straube, U. ; Danel, A. ; Kamarinos, G.
Pub. info.: Proceedings of the Symposium on Crystalline Defects and Contamination, their Impact and Control in Device Manufacturing II.  pp.385-393,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-22
4.

Conference Proceedings
Conference Proceedings
4. MECHANICAL RESISTANCE OF FINE MICROSTRUCTURES RELATED TO PARTICLE CLEANING MECHANISMS
Tardif, F. ; Raccurt, O. ; Barbe, J.C. ; De Crecy, F. ; Besson, P. ; Danel, A.
Pub. info.: Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium.  pp.153-160,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-26
5.

Conference Proceedings
Conference Proceedings
5. MONITORING OF NOBLE METALS IN HF BASED CHEMISTRIES USING μ-PCD,SPV,SCI, and SCP
Danel, A. ; Straube, U. ; Kamarinos, G. ; Kamieniecki, E. ; Tardif, F.
Pub. info.: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.400-407,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-35
6.

Conference Proceedings
Conference Proceedings
6. PHOTORESIST STRIPPING USING SUPERCRITICAL CO2 - BASED PROCESSES
Perrut, V. ; Danel, A. ; Millet, C. ; Daviot, J. ; Rignon, M. ; Tardif, F.
Pub. info.: Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium.  pp.246-253,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-26
7.

Conference Proceedings
Conference Proceedings
7. COPPER LOW-k CONTAMINANTION AND POST ETCH RESIDUES REMOVAL USING SUPERCRITICAL C02-BASED PROCESSES
Millet, C. ; Daviot, J. ; Danel, A. ; Perrut, V. ; Tardif, F. ; Broussous, L. ; Renault, O.
Pub. info.: Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium.  pp.271-278,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-26
8.

Conference Proceedings
Conference Proceedings
8. REVERSING OF SILICON SURFACE AGING BY LAMP CLEANING
Shanmugasundaram, K. ; Chang, K. ; Shallenberger, J. ; Danel, A. ; Tardif, F. ; Ruzyllo, J.
Pub. info.: Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium.  pp.348-355,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-26