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11 results

Conference Proceedings

1. Investigation of plasma-induced erosion of multilayer condenser optics

Tanaka, Y. ; Oizumi, H. ; Hashimoto, T. ; Kumasaka, F. ; Nishiyama, I. ; Abe, T. ; Mohri, H. ; Hayashi, N.

Pub. info.:	Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA. pp.128-139, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5751

Conference Proceedings

2. Current status of Mo-Si multilayer formation in ASET for low-defect-density mask blanks for EUV lithography [6349-122]

Hiruma, K. ; Tanaka, Y. ; Miyagaki, S. ; Yamanashi, H. ; Nishiyama, I.

Pub. info.:	Photomask Technology 2006. pp.634937-634937, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6349

Conference Proceedings

3. Evaluation of defect repair of EUV mask absorber layer [5853-74]

Abe, T. ; Amano, T. ; Mohri, H. ; Hayashi, N. ; Tanaka, Y. ; Kumasaka, F. ; Nishiyama, I.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XII. pp.866-873, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5853

Conference Proceedings

4. Evaluation of resolution and LER in the resist patterns replicated by EUV micro-exposure tools [6151-07]

Kikuchi, Y. ; Tanaka, Y. ; Oizumi, H. ; Kumasaka, F. ; Goo, D. ; Nishiyama, I.

Pub. info.:	Emerging Lithographic Technologies X. pp.615107-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6151

Conference Proceedings

5. Investigation of several materials as buffer layer candidates of EUVL mask

Kim, D. ; Tanaka, Y. ; Yamanashi, H. ; Nishiyama, I.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XI. pp.841-848, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5446

Conference Proceedings

6. Study of mask process development for EUVL

Abe, T. ; Nishiguchi, M. ; Amano, T. ; Motonaga, T. ; Sasaki, S. ; Mohri, H. ; Hayashi, N. ; Tanaka, Y. ; Yamanashi, H. ; Nishiyama, I.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XI. pp.832-840, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5446

Conference Proceedings

7. EUV absorbance and dry-etching characteristics of TaGeN films for EUVL mask absorber

Tanaka, Y. ; Kim, D. ; Yamanashi, H. ; Nishiyama, I.

Pub. info.:	Emerging Lithographic Technologies VIII. pp.281-288, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5374

Conference Proceedings

8. Printability of contact-hole patterns in EUVL using O.3-NA HiNA optics [6151-97]

Tanaka, Y. ; Oizumi, H. ; Kikuchi, Y. ; Goo, D. ; Kumasaka, F. ; Nishiyama, I.

Pub. info.:	Emerging Lithographic Technologies X. pp.61512S-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6151

Conference Proceedings

9. EUV mask development status at ASET and DNP [6283-92]

Abe, T. ; Fujii, A. ; Mohri, H. ; Hayashi, N. ; Tanaka, Y. ; Nishiyama, I.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XIII. pp.62830H-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6283

10.

Conference Proceedings

10. Evaluation of dry etching and defect repair of EUVL mask absorber layer

Abe, T. ; Amano, T. ; Motonaga, T. ; Sasaki, S. ; Mohri, H. ; Hayashi, N. ; Tanaka, Y. ; Nishiyama, I.

Pub. info.:	24th Annual BACUS Symposium on Photomask Technology. pp.1435-1444, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5567

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