Resonator using polarization beamsplitter prism for microlithography KrF excimer laser

Resonator using polarization beamsplitter prism for microlithography KrF excimer laser

Author(s):

Yamanaka,K. ( Matsushita Research Institute Tokyo,Inc. (Japan) )
Hashidate,Y. ( Matsushita Research Institute Tokyo,Inc. (Japan) )
Takahashi,H. ( Matsushita Research Institute Tokyo,Inc. (Japan) )
Furuya,N. ( Matsushita Research Institute Tokyo,Inc. (Japan) )

Publication title:

Laser Resonators

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3267

Pub. Year:

1998

Page(from):

296

Page(to):

303

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427069 [0819427063]

Language:

English

Call no.:

P63600/3267

Type:

Conference Proceedings

Details

TDL ID:	ZA00016926
Series ID:	PA00000029
Conf. info. (Name):	Photonics West : Laser Resonators
Conf. info. (Number):	1998
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	1998.01.26-1998.01.27

Similar Items:

1 Conference Proceedings High-power KrF excimer laser with a solid state switch for microlithography Mizoguchi,H., Ito,N., Nakarai,H., Kobayashi,Y., Itakura,Y., Komori,H., Wakabayashi,O., Aruga,T., Sakugawa,T., … SPIE-The International Society for Optical Engineering	7 Conference Proceedings Realization of practical attenuated phase-shift mask with high-transmission KrF excimer laser exposure Toyama,N., Miyashita,H., Morikawa,Y., Fujita,H., Iwase,K., Mohri,H., Hayashi,N., Sano,H. SPIE - The International Society for Optical Engineering
2 Conference Proceedings High-resolution microlithography using a 193-nm excimer laser source Rizvi,N.H., Ashworth,D., Gower,M.C. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Dynamics study of multiwavelength excitation process using F2 and KrF excimer lasers Obata, K., Sugioka, K., Inamura, T., Takai, H., Toyoda, K., Midorikawa, K. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Submicron Write Track Fabrication Using RIE and KrF Excimer Laser Stepper Okada, T., Yoshida, N., Etoh, K., Nunokawa, I., Fuyama, M., Kawabe, T. Electrochemical Society	9 Conference Proceedings GaN etching by simultaneous irradiation of KrF excimer laser and F2 laser Akane,T., Sugioka,K., Obata,K., Nomura,S., Hammura,K., Aoki,N., Toyoda,K., Aoyagi,Y., Midorikawa,K. SPIE-The International Society for Optical Engineering
4 Conference Proceedings High-repetition-rate ArF excimer laser for microlithography Wakabayashi,O., Enami,T., Ishii,K., Terashima,K., Itakura,Y., Watanabe,T., Ohta,T., Ohbu,A., Kubo,H., Tanaka,H., … SPIE-The International Society for Optical Engineering	10 Conference Proceedings High-power excimer laser-generated plasma source for x-ray microlithography H. Shields, M.F. Powers, I.C.E. Turcu, I.N. Ross, J.R. Maldonado Society of Photo-optical Instrumentation Engineers
5 Conference Proceedings Compact ArF excimer lasers specific to microlithography and surgery Sekita,H., Yano,J., Tada,A., Tamegai,M., Yoshida,K., Kasamatsu,T., Ito,S., Saito,T., Ogura,Y. SPIE-The International Society for Optical Engineering	11 Conference Proceedings High-spectral-purity and high-durability kHz KrF excimer laser with advanced rf preionization discharge Enami,T., Wakabayashi,O., Nishisaka,T., Suzuki,N., Nire,T., Mizoguchi,H., Nakarai,H., Tanaka,H., Ariga,T., Shio,K., … SPIE-The International Society for Optical Engineering
6 Conference Proceedings PMMA microstructure as KrF excimer-laser LIGA material Yang,C.R., Chou,B.C.S., Chou,E.H.Y., Lin,F.H.H., Kuo,W.K., Luo,R.K.S., Chang,J.W., Wei,Z.J. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Immersion microlithography at 193 nm with a Talbot prism interferometer Bourov, A., Fan, Y., Cropanese, F.C., Lafferty, N.V., Zavyalova, L.V., Kang, H., Smith, B.W. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12