Characteristics optimization of mask materials for hyper-NA lithography
- Author(s):
Y. Morikawa ( Dai Nippon Printing Co., Ltd. (Japan) ) T. Suto ( Dai Nippon Printing Co., Ltd. (Japan) ) T. Nagai ( Dai Nippon Printing Co., Ltd. (Japan) ) Y. Inazuki ( Dai Nippon Printing Co., Ltd. (Japan) ) T. Adachi ( Dai Nippon Printing Co., Ltd. (Japan) ) Y. Kitahata ( Dai Nippon Printing Co., Ltd. (Japan) ) T. Yokoyama ( Dai Nippon Printing Co., Ltd. (Japan) ) N. Toyama ( Dai Nippon Printing Co., Ltd. (Japan) ) H. Mohri ( Dai Nippon Printing Co., Ltd. (Japan) ) N. Hayashi ( Dai Nippon Printing Co., Ltd. (Japan) ) - Publication title:
- EMLC 2007 : 23rd european mask and lithography conference : 22-25 January 2007, Grenoble, France
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6533
- Pub. Year:
- 2007
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466556 [0819466557]
- Language:
- English
- Call no.:
- P63600/6533
- Type:
- Conference Proceedings
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