Prospect of Hf-Dared Gate Dielectric by PVD with FUSI Gate for LSTP Application
- Author(s):
M. Niwa R. Mitsuhashi S. Hayashi K. Yamamoto Y. Harada M. Kubota A. Rothchild T. Hoffmann S. Kubicek S. DeGendt M. Heyns A. Lauwers S. Biesemans J. Kittle - Publication title:
- Physics and technology of high-k gate dielectrics III
- Title of ser.:
- ECS transactions
- Ser. no.:
- 1(5)
- Pub. Year:
- 2006
- Page(from):
- 269
- Page(to):
- 286
- Pages:
- 18
- Pub. info.:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 19385862
- ISBN:
- 9781566774444 [1566774446]
- Language:
- English
- Call no.:
- E23400/1-5
- Type:
- Conference Proceedings
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