1.

Conference Proceedings
Conference Proceedings
1. CD analysis of advanced photolithography and its impact on critical design structures [6156-12]
Romero, K. A. ; Seltmann, R. ; Burbach, G. ; Stephan, R. ; Paufler, J. ; Greenlaw, D.
Pub. info.: Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA.  pp.61560D-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6156
2.

Conference Proceedings
Conference Proceedings
2. High performance SOI technology for sub-45nm gate length CMOS manufacturing Invited
Horstmann, M. ; Greenlaw, D. ; Huebler, P. ; Stephan, R. ; Feudel, Th. ; Wei, A. ; Frohberg, K. ; Hoentschel, J. ; Javorka, P. ; Burbach, G. ; Schwan, C. ; Peters, C. ; Lenski, M ; Press, P. ; Kammler, Th. ; Bierstedt, H. ; Otterbach, R. ; Neu, A. ; Wieczorek, K. ; Schaller, M. ; Salz, H. ; Hohage, J. ; Ruelke, H. ; Klais, J. ; Grasshoff, G. ; Ehrichs, E. ; Goad, S. ; Raab, M. ; Kepler, N.
Pub. info.: Silicon-on-insulator technology and devices XII : proceedings of the international symposium.  pp.57-68,  2005.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-03
3.

Conference Proceedings
Conference Proceedings
3. Towards 0.5 nm EOT Scaling of HfO2/Metal Electrode Gate Stacks
Peterson, J. J. ; Brown, G. A. ; Matthews, K. ; Gutt, J. ; Gopalan, S. ; Li, H. -J. ; Kirsch, P. ; Barnett, J. ; Moumen, N. ; Huffman, C. ; Majhi, P. ; Chaudhary, N. ; Young, C. D. ; Sassman, B. ; Lee, B. -H. ; Ruelke, H. ; Schuehrer, H. ; Stephan, R. ; Wei, A. ; Werner, T. ; Wieczorek, K. ; Raab, M.
Pub. info.: Dielectrics for nanosystems: materials science, processing, reliability, and manufacturing : proceedings of the First international symposium.  pp.443-451,  2004.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-04
4.

Conference Proceedings
Conference Proceedings
4. ACLV-analysis in production and its impact on product performance
Seltmann, R. ; Stephan, R. ; Mazur, M. ; Spence, C. ; Fontaine, B.L. ; Stankowski, D. ; Poock, A. ; Grundke, W.
Pub. info.: Optical Microlithography XVI.  Part One  pp.530-540,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040