1.

Conference Proceedings
Conference Proceedings
1. A new monocyclic fluoropolymer for 157-nm and 193-nm photoresists
Houlihan, F. ; Sakamuri, R. ; Hamilton, K. ; Dimerli, A. ; Rentkiewicz, D. ; Romano, A. ; Dammel, R. R. ; Wei, Y. ; Stepanenko, N. ; Sebald, M. ; Hohle, C. ; Conley, W. ; Miller, D. ; Itani, T. ; Shigematsu, M. ; Kawaguchi, E.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.554-563,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
2.

Conference Proceedings
Conference Proceedings
2. Recent advances in fluorinated resists for application at 157 nm
Houlihan, F.M. ; Sakamuri, R. ; Romano, A. ; Rentkiewicz, D. ; Dammel, R.R. ; Conley, W.E. ; Miller, D.A. ; Sebald, M. ; Stepanenko, N. ; Markert, M. ; Mierau, U. ; Vermeir, I. ; Hohle, C. ; Itani, T. ; Shigematsu, M. ; Kawaguchi, E.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.134-150,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376