1.

Conference Proceedings
Conference Proceedings
1. Fast topography simulation using differential method
Zinn, S.Y. ; Kim, S.-H. ; Choi, S.-W. ; Sohn, J.-M.
Pub. info.: Optical Microlithography XVI.  Part One  pp.92-100,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
2.

Conference Proceedings
Conference Proceedings
2. Improvement of shot uniformity on a wafer by controlling backside transmittance distribution of a photomask
Park, J.R. ; Kim, S.H. ; Yeo, G.-S. ; Choi, S.-W. ; Ki, W.-T. ; Yoon, H.-S. ; Sohn, J.-M.
Pub. info.: Optical Microlithography XVI.  Part One  pp.553-560,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
3.

Conference Proceedings
Conference Proceedings
3. Feasibility evaluations of alternating phase-shift mask for imaging sub-80nm feature with KrF
Kang, M.-A. ; Kim, S.-H. ; Shin, I.-K. ; Choi, S.-W. ; Sohn, J.-M.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.1115-1124,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
4.

Conference Proceedings
Conference Proceedings
4. Phase defect printability analysis for chromeless phase lithography technology
Huh, S. ; Park, J.H. ; Chung, D.-H. ; Kim, C.-H. ; Shin, I.-K. ; Choi, S.-W. ; Sohn, J.-M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.787-795,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
5.

Conference Proceedings
Conference Proceedings
5. Identification of defect source to control reticle defect density for CAR and dry etching in the photomask process
Cho, S.-Y. ; Ahn, W.-S. ; Cho, W.-I. ; Sung, M.-G. ; Kim, Y.-H. ; Choi, S.-W. ; Yoon, H.-S. ; Sohn, J.-M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.107-117,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
6.

Conference Proceedings
Conference Proceedings
6. Develpment of etch rate uniformity adjustment technology for photomask quartz etch in manufacturing the 100% attenuated PSM
Jang, I.-Y. ; Lee, J.-Y. ; Kim, Y.-H. ; Choi, S.-W. ; Sohn, J.-M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.246-252,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
7.

Conference Proceedings
Conference Proceedings
7. Study of characteristics and control of haze contamination induced by photochemical reaction
Han, S.-J. ; Yu, S.-Y. ; Sung, M.-G. ; Kim, Y.-H. ; Yoon, H.-S. ; Sohn, J.-M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.563-567,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
8.

Conference Proceedings
Conference Proceedings
8. Analytical approach to X-phenomenon in alternating phase-shifting masks
Park, J.R. ; Kim, S.-H. ; Lee, H.-J. ; Jang, I.-Y. ; Choi, Y.-H. ; Yang, S.-H. ; Lee, Y.-H. ; Kim, Y.-H. ; Choi, S.-W. ; Yoon, H.-S. ; Sohn, J.-M.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1209-1216,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
9.

Conference Proceedings
Conference Proceedings
9. PSM defect printability of extremely low-k1 sub-130-nm KrF lithography
Cho, W.-I. ; Yeo, G. ; Moon, S.-Y. ; Yoon, H.-S. ; Sohn, J.-M.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1202-1208,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
10.

Conference Proceedings
Conference Proceedings
10. Fogging effect consideration in mask process at 50-KeV e-beam systems
Yang, S.-H. ; Choi, Y.-H. ; Park, J.-R. ; Kim, Y.-H. ; Choi, S.-W. ; Yoon, H.-S. ; Sohn, J.-M.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.786-791,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
11.

Conference Proceedings
Conference Proceedings
11. Simple method for separating and evaluating origins of a side error in mask CD uniformity: photomask blanks and mask-making processes
Choi, Y.-H. ; Park, J.R. ; Sung, M.-G. ; Yang, S.-H. ; Kim, S.-H. ; Lee, H.-J. ; Lee, J.-Y. ; Jang, I.Y. ; Kim, Y.H. ; Choi, S.-W. ; Yoon, H.-S. ; Sohn, J.-M.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.819-825,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
12.

Conference Proceedings
Conference Proceedings
12. Comparison of vector theories for aerial image calculation
Ahn, B.-S. ; Zinn, S.Y. ; Choi, S.-W. ; Sohn, J.-M.
Pub. info.: Optical Microlithography XVI.  Part Three  pp.1529-1535,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
13.

Conference Proceedings
Conference Proceedings
13. Application of Cr-less mask technology for sub-100-nm gate with single exposure
Kim, S.-H. ; Chung, D.-H. ; Park, J.S.. ; Shin, I.K. ; Choi, S.W. ; Sohn, J.-M. ; Lee, J.-H. ; Shin, H.-S. ; Chen, J.F. ; Van Den Broeke, D.J.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.568-578,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
14.

Conference Proceedings
Conference Proceedings
14. Identification of defect source to control reticle defect density for CAR and dry etching in the photomask process
Cho, S.-Y. ; Ahn, W.-S. ; Cho, W.-I. ; Sung, M.-G. ; Moon, S.-Y. ; Choi, S.-W. ; Yoon, H.-S. ; Sohn, J.-M.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.964-971,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
15.

Conference Proceedings
Conference Proceedings
15. Proximity effect correction optimization considering fogging and loading effects compensation
Yang, S.-H. ; Choi, Y.-H. ; Park, J.-R. ; Kim, Y.H. ; Choi, S.-W. ; Sohn, J.-M.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part Two  pp.977-984,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689
16.

Conference Proceedings
Conference Proceedings
16. Measurement of the flare and in-field linewidth variation due to the flare
Jeong, T.M. ; Choi, S.-W. ; Woo, S.-G. ; Han, W.-S. ; Sohn, J.-M.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1465-1473,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
17.

Conference Proceedings
Conference Proceedings
17. New resolution enhancement technology for manufacturing sub-100-nm technology
Chung, D.-H. ; Park, J.-Y. ; Lee, M.-K. ; Shin, I.-K. ; Choi, S.-W. ; Yoon, H.-S. ; Sohn, J.-M. ; Chen, J.F. ; Van Den Broeke, D.J.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1492-1499,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
18.

Conference Proceedings
Conference Proceedings
18. Full-chip application for SRAM gate at 100-nm node and beyond using chromeless phase lithography
Park, J.-S. ; Kim, S.-H. ; Shin, I.-K. ; Choi, S.-W. ; Sohn, J.-M. ; Lee, J.-H. ; Shin, H.-S. ; Laidig, T.L. ; Van den Broeke, D.J. ; Chen, J.F.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.112-121,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
19.

Conference Proceedings
Conference Proceedings
19. Simulation of mask CD variation for different local densities with in-house developed e-beam lithography simulator
Kim, M.-Y. ; Ki, W.-T. ; Lee, S.-H. ; Choi, J.-H. ; Choi, S.-W. ; Sohn, J.-M.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.50-58,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
20.

Conference Proceedings
Conference Proceedings
20. New method for approaching the loading-free process for photomask Cr etching
Jang, I.-Y. ; Lee, J.-Y. ; Moon, S.-Y. ; Choi, S.-W. ; Sohn, J.-M.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.59-65,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
21.

Conference Proceedings
Conference Proceedings
21. Dose-modulation-induced mask CD error on simultaneous correction of fogging and loading effect
Lee, H. ; Yang, S.-H. ; Park, J.-H. ; Moon, S.-Y. ; Choi, S.-W. ; Sohn, J.-M.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.666-672,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
22.

Conference Proceedings
Conference Proceedings
22. Research on the origin of particle generation in ICP plasma reactor
Lee, J.-Y. ; Kim, N.-K. ; Jang, I.-Y. ; Mun, S.-Y. ; Choi, S.-W. ; Sohn, J.-M.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.1111-1119,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
23.

Conference Proceedings
Conference Proceedings
23. Development of mask-making process for CLM manufacturing technology
Park, J.-H. ; Chung, D.-H. ; Lee, M.-K. ; Shin, I.-K. ; Choi, S.-W. ; Yoon, H.-S. ; Sohn, J.-M. ; Chen, J.F. ; Van Den Broeke, D.J.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.727-736,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
24.

Conference Proceedings
Conference Proceedings
24. Optical properties of a-Si films for 157-nm lithography
Kim, S.K. ; Kim, Y.S. ; Kang, M.-A. ; Sohn, J.-M. ; No, K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.127-135,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130