1.

Conference Proceedings
Conference Proceedings
1. Fast topography simulation using differential method
Zinn, S.Y. ; Kim, S.-H. ; Choi, S.-W. ; Sohn, J.-M.
Pub. info.: Optical Microlithography XVI.  Part One  pp.92-100,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
2.

Conference Proceedings
Conference Proceedings
2. Improvement of shot uniformity on a wafer by controlling backside transmittance distribution of a photomask
Park, J.R. ; Kim, S.H. ; Yeo, G.-S. ; Choi, S.-W. ; Ki, W.-T. ; Yoon, H.-S. ; Sohn, J.-M.
Pub. info.: Optical Microlithography XVI.  Part One  pp.553-560,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
3.

Conference Proceedings
Conference Proceedings
3. Feasibility evaluations of alternating phase-shift mask for imaging sub-80nm feature with KrF
Kang, M.-A. ; Kim, S.-H. ; Shin, I.-K. ; Choi, S.-W. ; Sohn, J.-M.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.1115-1124,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
4.

Conference Proceedings
Conference Proceedings
4. Phase defect printability analysis for chromeless phase lithography technology
Huh, S. ; Park, J.H. ; Chung, D.-H. ; Kim, C.-H. ; Shin, I.-K. ; Choi, S.-W. ; Sohn, J.-M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.787-795,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
5.

Conference Proceedings
Conference Proceedings
5. Identification of defect source to control reticle defect density for CAR and dry etching in the photomask process
Cho, S.-Y. ; Ahn, W.-S. ; Cho, W.-I. ; Sung, M.-G. ; Kim, Y.-H. ; Choi, S.-W. ; Yoon, H.-S. ; Sohn, J.-M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.107-117,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
6.

Conference Proceedings
Conference Proceedings
6. Develpment of etch rate uniformity adjustment technology for photomask quartz etch in manufacturing the 100% attenuated PSM
Jang, I.-Y. ; Lee, J.-Y. ; Kim, Y.-H. ; Choi, S.-W. ; Sohn, J.-M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.246-252,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
7.

Conference Proceedings
Conference Proceedings
7. Study of characteristics and control of haze contamination induced by photochemical reaction
Han, S.-J. ; Yu, S.-Y. ; Sung, M.-G. ; Kim, Y.-H. ; Yoon, H.-S. ; Sohn, J.-M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.563-567,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
8.

Conference Proceedings
Conference Proceedings
8. Analytical approach to X-phenomenon in alternating phase-shifting masks
Park, J.R. ; Kim, S.-H. ; Lee, H.-J. ; Jang, I.-Y. ; Choi, Y.-H. ; Yang, S.-H. ; Lee, Y.-H. ; Kim, Y.-H. ; Choi, S.-W. ; Yoon, H.-S. ; Sohn, J.-M.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1209-1216,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
9.

Conference Proceedings
Conference Proceedings
9. PSM defect printability of extremely low-k1 sub-130-nm KrF lithography
Cho, W.-I. ; Yeo, G. ; Moon, S.-Y. ; Yoon, H.-S. ; Sohn, J.-M.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1202-1208,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
10.

Conference Proceedings
Conference Proceedings
10. Fogging effect consideration in mask process at 50-KeV e-beam systems
Yang, S.-H. ; Choi, Y.-H. ; Park, J.-R. ; Kim, Y.-H. ; Choi, S.-W. ; Yoon, H.-S. ; Sohn, J.-M.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.786-791,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889