1.

Conference Proceedings
Conference Proceedings
1. Improvement of shot uniformity on a wafer by controlling backside transmittance distribution of a photomask
Park, J.R. ; Kim, S.H. ; Yeo, G.-S. ; Choi, S.-W. ; Ki, W.-T. ; Yoon, H.-S. ; Sohn, J.-M.
Pub. info.: Optical Microlithography XVI.  Part One  pp.553-560,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
2.

Conference Proceedings
Conference Proceedings
2. Identification of defect source to control reticle defect density for CAR and dry etching in the photomask process
Cho, S.-Y. ; Ahn, W.-S. ; Cho, W.-I. ; Sung, M.-G. ; Kim, Y.-H. ; Choi, S.-W. ; Yoon, H.-S. ; Sohn, J.-M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.107-117,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
3.

Conference Proceedings
Conference Proceedings
3. Study of characteristics and control of haze contamination induced by photochemical reaction
Han, S.-J. ; Yu, S.-Y. ; Sung, M.-G. ; Kim, Y.-H. ; Yoon, H.-S. ; Sohn, J.-M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.563-567,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
4.

Conference Proceedings
Conference Proceedings
4. Analytical approach to X-phenomenon in alternating phase-shifting masks
Park, J.R. ; Kim, S.-H. ; Lee, H.-J. ; Jang, I.-Y. ; Choi, Y.-H. ; Yang, S.-H. ; Lee, Y.-H. ; Kim, Y.-H. ; Choi, S.-W. ; Yoon, H.-S. ; Sohn, J.-M.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1209-1216,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
5.

Conference Proceedings
Conference Proceedings
5. PSM defect printability of extremely low-k1 sub-130-nm KrF lithography
Cho, W.-I. ; Yeo, G. ; Moon, S.-Y. ; Yoon, H.-S. ; Sohn, J.-M.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1202-1208,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
6.

Conference Proceedings
Conference Proceedings
6. Fogging effect consideration in mask process at 50-KeV e-beam systems
Yang, S.-H. ; Choi, Y.-H. ; Park, J.-R. ; Kim, Y.-H. ; Choi, S.-W. ; Yoon, H.-S. ; Sohn, J.-M.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.786-791,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
7.

Conference Proceedings
Conference Proceedings
7. Simple method for separating and evaluating origins of a side error in mask CD uniformity: photomask blanks and mask-making processes
Choi, Y.-H. ; Park, J.R. ; Sung, M.-G. ; Yang, S.-H. ; Kim, S.-H. ; Lee, H.-J. ; Lee, J.-Y. ; Jang, I.Y. ; Kim, Y.H. ; Choi, S.-W. ; Yoon, H.-S. ; Sohn, J.-M.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.819-825,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
8.

Conference Proceedings
Conference Proceedings
8. Identification of defect source to control reticle defect density for CAR and dry etching in the photomask process
Cho, S.-Y. ; Ahn, W.-S. ; Cho, W.-I. ; Sung, M.-G. ; Moon, S.-Y. ; Choi, S.-W. ; Yoon, H.-S. ; Sohn, J.-M.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.964-971,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
9.

Conference Proceedings
Conference Proceedings
9. New resolution enhancement technology for manufacturing sub-100-nm technology
Chung, D.-H. ; Park, J.-Y. ; Lee, M.-K. ; Shin, I.-K. ; Choi, S.-W. ; Yoon, H.-S. ; Sohn, J.-M. ; Chen, J.F. ; Van Den Broeke, D.J.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1492-1499,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
10.

Conference Proceedings
Conference Proceedings
10. Development of mask-making process for CLM manufacturing technology
Park, J.-H. ; Chung, D.-H. ; Lee, M.-K. ; Shin, I.-K. ; Choi, S.-W. ; Yoon, H.-S. ; Sohn, J.-M. ; Chen, J.F. ; Van Den Broeke, D.J.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.727-736,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754