High-power laser-plasma x-ray source for lithography
- Author(s):
Gaeta, C.J. ( JMAR Research, Inc. (USA) ) Rieger, H. Turcu, I.C.E. Forber, R.A. Cassidy, K.L. Campeau, S.M. Powers, M.J. Maldonado, J.R. Morris, J.H. Foster, R.M. Smith, H.I. ( Massachusetts Institute of Technology (USA) ) Lim, M.H. - Publication title:
- Emerging Lithographic Technologies VI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4688
- Pub. Year:
- 2002
- Vol.:
- Part Two
- Page(from):
- 818
- Page(to):
- 833
- Pages:
- 16
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444349 [0819444340]
- Language:
- English
- Call no.:
- P63600/4688
- Type:
- Conference Proceedings
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