Illumination, acid diffusion, and process optimization considerations for 193-nm contact hole resists
- Author(s):
Kudo, T. ( Clariant Corp. (USA) ) Alemy, E.L. Dammel, R.R. Kim, W.-K. Lee, S.-H. Masuda, S. McKenzie, D.S. Rahman, M.D. Romano, A.R. Padmanaban, M. Chun, J.-S. ( Cypress Semiconductor Corp. (USA) ) Jung, J.-C. ( Hynix Semiconductor, Inc. (Korea) ) Lee, S.-K. Shin, K.-S. Kim, H.-S. - Publication title:
- Advances in Resist Technology and Processing XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4690
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 150
- Page(to):
- 159
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444363 [0819444367]
- Language:
- English
- Call no.:
- P63600/4690
- Type:
- Conference Proceedings
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