Wurz, R. ; Bohne, W. ; Fuhs, W. ; Rohrich, J. ; Schmidt, M. ; Schopke, A. ; Selle, B.
Pub. info.:
Current issues in heteroepitaxial growth--stress relaxation and self assembly : symposium held November 26-29, 2001, Boston, Massachusetts, U.S.A. pp.93-98, 2002. Warrendale, Pa.. Materials Research Society
Applications with weather satellites II : 9-11 November 2004, Honolulu, Hawaii, USA. pp.28-37, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Li, J. ; McVittie, J.P. ; Ferziger, J. ; Saraswat, K.C. ; Schmidt, M. ; Dobkin, D.
Pub. info.:
Proceedings of the third Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films. pp.570-580, 1994. Pennington, NJ. Electrochemical Society
Ignat'ev, N.V. ; Hilarius, V. ; Heider, U. ; Kuehner, A. ; Schmidt, M. ; Kucherina, A. ; Sartori, P.
Pub. info.:
Reactive intermediates in organic and biological electrochemistry : proceedings of the International Symposium in Honor of the Late Professor Eberhard Steckhan. pp.113-116, 2001. Pennington, N.J.. Electrochemical Society
Proceedings of the Fourth International Symposium on Quantum Confinement : nanoscale materials, devices, and systems. pp.287-297, 1997. Pennington, NJ. Electrochemical Society
New developments in selective oxidation : proceedings of an international symposium, Rimini, Italy, September 18-22, 1989. pp.71-, 1990. Amsterdam. Elsevier
OFS-13 : 13th International Conference on Optical Fiber Sensors & Workshop on Device and System Technology toward Future Optical Fiber Communication and Sensing : April 12-16, 1999, Kyongju Hyundai Hotel, Kyongju, Korea. pp.410-413, 1999. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Schmidt, M. ; Ludsteck, A. ; Wiest, F. ; Schuhe, J. ; Eisele, I.
Pub. info.:
Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium. pp.311-318, 2005. Pennington, NJ. Electrochemical Society