1.

Conference Proceedings
Conference Proceedings
1. Maskless EUV lithography via optically addressed modulator
Teramoto, Y. ; Sato, H. ; Bessho, K. ; Niimi, G. ; Shirai, T. ; Yamatani, D. ; Takemura, T. ; Yokoto, T. ; Paul, K. C. ; Kabuki, K. ; Miyauchi, K. ; Ikeuchi, M. ; Hotta, K. ; Yoshioka, M. ; Toyoda, K.
Pub. info.: Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA.  pp.349-354,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5751
2.

Conference Proceedings
Conference Proceedings
2. Development of Xe-filled capillary discharge extreme-ultraviolet radiation source for semiconductor lithography
Teramoto, Y. ; Sato, H. ; Bessho, K. ; Miyauchi, K. ; Ikeuchi, M. ; Okubo, K. ; Yoshioka, M. ; Toyoda, K.
Pub. info.: Emerging Lithographic Technologies VII.  2  pp.767-775,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037
3.

Conference Proceedings
Conference Proceedings
3. High-repetition-rate MPC generator-driven capillary Z-pinch EUV source
Teramoto, Y. ; Sato, H. ; Bessho, K. ; Shirai, T. ; Yamatani, D. ; Takemura, T. ; Yokota, T. ; Paul, K.C. ; Kabuki, K. ; Miyauchi, K. ; Ikeuchi, M. ; Okubo, K. ; Hotta, K. ; Yoshioka, M. ; Toyoda, K.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.935-942,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374