1.

Conference Proceedings
Conference Proceedings
1. Split and design guidelines for double patterning
V. Wiaux ; S. Verhaegen ; S. Cheng ; F. Iwamoto ; P. Jaenen
Pub. info.: Optical Microlithography XXI.  1  pp.692409-1-692409-11,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6924
2.

Conference Proceedings
Conference Proceedings
2. A methodology for double patterning compliant split and design
V. Wiaux ; S. Verhaegen ; F. Iwamoto ; M. Maenhoudt ; T. Matsuda
Pub. info.: Lithography Asia 2008.  1  pp.71401X-1-71401X-14,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7140
3.

Conference Proceedings
Conference Proceedings
3. Double patterning design split implementation and validation for the 32nm node
M. Drapeau ; V. Wiaux ; E. Hendrickx ; S. Verhaegen ; T. Machida
Pub. info.: Design for manufacturability through design-process integration : 28 February-2 March 2007, San Jose, California, USA.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6521
4.

Conference Proceedings
Conference Proceedings
4. Double pattern EDA solutions for 32nm HP and beyond
G. E. Bailey ; A. Tritchkov ; J. Park ; L. Hong ; V. Wiaux ; E. Hendrickx ; S. Verhaegen ; P. Xie ; J. Versluijs
Pub. info.: Design for manufacturability through design-process integration : 28 February-2 March 2007, San Jose, California, USA.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6521