1.

Conference Proceedings
Conference Proceedings
1. Double patterning design split implementation and validation for the 32nm node
M. Drapeau ; V. Wiaux ; E. Hendrickx ; S. Verhaegen ; T. Machida
Pub. info.: Design for manufacturability through design-process integration : 28 February-2 March 2007, San Jose, California, USA.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6521
2.

Conference Proceedings
Conference Proceedings
2. Double pattern EDA solutions for 32nm HP and beyond
G. E. Bailey ; A. Tritchkov ; J. Park ; L. Hong ; V. Wiaux ; E. Hendrickx ; S. Verhaegen ; P. Xie ; J. Versluijs
Pub. info.: Design for manufacturability through design-process integration : 28 February-2 March 2007, San Jose, California, USA.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6521