1.

Conference Proceedings
Conference Proceedings
1. Optimization of optical properties of silicon-based anti-reflective spin-on hardmask materials
S. K. Kim ; H. M. Cho ; C. Woo ; S. R. Koh ; M. Kim
Pub. info.: Lithography Asia 2008.  2  pp.71402V-1-71402V-7,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7140
2.

Conference Proceedings
Conference Proceedings
2. Use of spin-on-hard mask materials for nano scale patterning technology
W.-H. Wu ; E. Y. Chang ; H.-S. Cheon ; S. K. Kim ; H. M. Cho
Pub. info.: Lithography Asia 2008.  2  pp.71402Q-1-71402Q-12,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7140
3.

Conference Proceedings
Conference Proceedings
3. Silicon-based anti-reflective spin-on hardmask materials for 45 nm pattern of immersion ArF lithography
S. K. Kim ; H. M. Cho ; S. R. Koh ; M. Kim ; H. C. Yoon
Pub. info.: Advances in resist materials and processing technology XXV.  2  pp.69232Q-1-69232Q-8,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6923