1.

Conference Proceedings
Conference Proceedings
1. Gas Phase Conditioning of Silicon Surface after Reactive Ion Etching
Hwang, D.K. ; Ruzyllo, J.
Pub. info.: Proceedings of the eleventh International Symposium on Plasma Processing.  pp.555-563,  1996.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 96-12
2.

Conference Proceedings
Conference Proceedings
2. EFFECT OF RIE SEQUENCE AND POST-RIE SURFACE PROCESSING ON THE RELIABILITY OF GATE OXIDE lN A TRENCH
Grebs, T. ; Ridley, R. ; Chang, K. ; Wu, C.-T. ; Agarwal, R. ; Mytych, J. ; Dimachkie, W. ; Dolny, G. ; Michalowicz, J. ; Ruzyllo, J.
Pub. info.: Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium.  pp.108-115,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-26
3.

Conference Proceedings
Conference Proceedings
3. SILICON SURFACES EXPOSED TO ANHYDROUS HF/CH3OH ETCHING
Torek, K. ; Ruzyllo, J. ; Kamieniecki, E.
Pub. info.: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.384-391,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-7
4.

Conference Proceedings
Conference Proceedings
4. REMOVAL OF Al FROM SILICON SURFACES USING UV/Cl2
Daffron, C. ; Torek, K. ; Ruzyllo, J. ; Kamieniecki, E.
Pub. info.: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.281-287,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-7
5.

Conference Proceedings
Conference Proceedings
5. CLEANING OF SILICON SURFACE AFTER RIE USING UV/OZONE AND HF/CH3OH
Hwang, D.K. ; Ruzyllo, J. ; Kamieniecki, E.
Pub. info.: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.401-408,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-7
6.

Conference Proceedings
Conference Proceedings
6. DETERMINATION OF NATIVE OXIDE REMOVAL IN CLUSTER COMPATIBLE DRY CLEANING SYSTEMS USING A SURFACE PHOTOVOLTAGE TECHNIQUE
Brubaker, M. ; Staffa, J. ; Roman, P. ; Fakhouri, S. ; Ruzyllo, J.
Pub. info.: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.408-414,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-35
7.

Conference Proceedings
Conference Proceedings
7. Processing of Thick Thermal Gate Oxides in Trenchs
Wu, C.T. ; Ridley, R. ; Dolny, G. ; Grebs, T. ; Hao, J. ; Suliman, S. ; Venkataraman, B. ; Awadelkarim, O. ; Williams, R. ; Roman, P. ; Ruzyllo, J.
Pub. info.: Silicon Nitride and Silicon Dioxide Thin Insulating Films : proceedings of the sixth International Symposium.  pp.127-133,  2001.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2001-7
8.

Conference Proceedings
Conference Proceedings
8. MONITORING OF Fe CONTAMINATION ON Si SURFACES USING NON-CONTACT SURFACE CHARGE PROFILER
Roman, P. ; Kashkoush, I. ; Novak, R.E. ; Kamieniecki, E. ; Ruzyllo, J.
Pub. info.: Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.344-349,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-20
9.

Conference Proceedings
Conference Proceedings
9. LOW-TEMPERATURE ATMOSPHERIC AMBIENT RAPID LAMP CLEANING OF SILICON SURFACES
Roman, P. ; Tsai, C.-L. ; Hengstebeck, R. ; Pantano, C. ; Berry, J. ; Kamieniecki, E. ; Ruzyllo, J.
Pub. info.: Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium.  pp.145-149,  1999.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-36
10.

Conference Proceedings
Conference Proceedings
10. THICKNESS DEPENDENT SENSITIVITY OF GATE OXIDES TO SURFACE CONTAMINATION
Ridley, R. ; Wu, C.-T. ; Roman, P. ; Dolny, G. ; Grebs, T. ; Stensney, F. ; Ruzyllo, J.
Pub. info.: Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium.  pp.158-164,  1999.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-36
11.

Conference Proceedings
Conference Proceedings
11. Studies of High-k Gate Dielectrics Deposited hy the Liquid Source Misted Chemical Deposition Method
Lee, D. ; Roman, P. ; Mumbauer, P. ; Grant, R. ; Horn, M. ; Ruzyllo, J.
Pub. info.: Low and high dielectric constant materials : materials science, processing, and reliability issues : proceedings of the fifth international symposium.  pp.237-242,  2000.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2000-5
12.

Conference Proceedings
Conference Proceedings
12. REVERSING OF SILICON SURFACE AGING BY LAMP CLEANING
Shanmugasundaram, K. ; Chang, K. ; Shallenberger, J. ; Danel, A. ; Tardif, F. ; Ruzyllo, J.
Pub. info.: Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium.  pp.348-355,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-26
13.

Conference Proceedings
Conference Proceedings
13. EFFECTS CONTROLLING INITIATION AND TERMINATION OF GAS-PHASE CLEANING REACTIONS
Staffa, J. ; Fakhouri, S. ; Brubaker, M. ; Roman, P. ; Ruzyllo, J.
Pub. info.: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.315-321,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-35
14.

Conference Proceedings
Conference Proceedings
14. Characterization of High-K Dielectrics Using the Non-Contact Surface Charge Profiler (SCP) Method
Roman, P. ; Lee, D. ; Mumbauer, P. ; Grant, R. ; Kamieniecki, E. ; Ruzyllo, J.
Pub. info.: Low and high dielectric constant materials : materials science, processing, and reliability issues : proceedings of the fifth international symposium.  pp.187-192,  2000.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2000-5
15.

Conference Proceedings
Conference Proceedings
15. STUDY OF THE EFFECT OF SILICON SURFCE TREATMENT ON EOT IN HIGH-k DIELECTRIC MOS GATE STACK
Chang, K. ; Shanmugasundaram, K. ; Lee, D.-O. ; Roman, P. ; Shallenberger, J. ; Chang, F.-M. ; Wang, J. ; Beck, R. ; Mumbauer, P. ; Grant, R. ; Ruzyllo, J.
Pub. info.: Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium.  pp.78-85,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-26
16.

Conference Proceedings
Conference Proceedings
16. Anhydrous HF Processing as an Alternative to HF/Water Processes
Staffa, J. ; Roman, P. ; Chang, K. ; Torek, K. ; Ruzyllo, J.
Pub. info.: Environmental, safety, and health issues in IC production : symposium held December 4-5, 1996, Boston, Massachusetts, U.S.A..  pp.9-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 447
17.

Conference Proceedings
Conference Proceedings
17. Selective Remote Plasma Etching of Si3N4 Over SIO2 at Elevated Temperature
Staffa, J. ; Luther, B. ; Hwang, D. ; Ruzyllo, J. ; Grant, R. ; March, D.
Pub. info.: ULSI science and technology, 1995 : proceedings of the Fifth International Symposium on Ultra Large Scale Integration Science and Technology.  pp.283-289,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-5
18.

Conference Proceedings
Conference Proceedings
18. Conditioning of Silicon Surface After RIE Using O2 and NF3 Remote Plasma
Hwang, D.K. ; Ruzyllo, J. ; Grant, R.
Pub. info.: ULSI science and technology, 1995 : proceedings of the Fifth International Symposium on Ultra Large Scale Integration Science and Technology.  pp.230-235,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-5
19.

Conference Proceedings
Conference Proceedings
19. The Effect of Carbon in Silicon on Oxidation Kinetics and Silicon Dioxide Integrity
Ridley, R.S. ; Brozek, T. ; Ruzyllo, J.
Pub. info.: ULSI science and technology, 1995 : proceedings of the Fifth International Symposium on Ultra Large Scale Integration Science and Technology.  pp.436-443,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-5
20.

Conference Proceedings
Conference Proceedings
20. 49 Characteristics of Hf(Si,O) Gate Dielectrics as a Function of Hf Content
Chang, K. ; Shallenberger, J. ; Chang, F.-M. ; Shanmugasundaram, K. ; Roman, P. ; Mumbauer, P. ; Ruzyllo, J.
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.404-410,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-05
21.

Conference Proceedings
Conference Proceedings
21. Feasibility of surface photovoltage based characterization of ultra-thin SOI wafers
Lukasiak, L. ; Kamieniecki, E. ; Jakubowski, A. ; Ruzyllo, J.
Pub. info.: Silicon-on-insulator technology and devices XI : proceedings of the international symposium.  pp.425-430,  2003.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-5
22.

Conference Proceedings
Conference Proceedings
22. GAS-PHASE SURFACE CONDITIONING IN A HIGH-k GATE CLUSTER
Roman, P. ; Lee, D.-O. ; Wang, J. ; Wu, C.-T. ; Subramanian, V. ; Brubaker, M. ; Mumbauer, P. ; Grant, R. ; Ruzyllo, J.
Pub. info.: Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium.  pp.241-248,  2001.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2001-26
23.

Conference Proceedings
Conference Proceedings
23. ETCHING OF SILICON NATIVE OXIDE USING ULTR-SLOW MULTICHARGED Arq+ IONS
Le Roux, V. ; Machicoane, G. ; Borsoni, G. ; Korwin-Pawlowski, M. ; Bechu, N. ; Kerdiles, S. ; Laffitte, R. ; Valuer, L. ; Roman, P. ; Wu, C.-T. ; Ruzyllo, J.
Pub. info.: Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium.  pp.249-257,  2001.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2001-26
24.

Conference Proceedings
Conference Proceedings
24. Monitoring of HF/H2O Treated Silicon Surfaces Using Non-Contact Surface Charge Measurements
Roman, P. ; Hwang, D. ; Torek, K. ; Ruzyllo, J. ; Kamieniecki, E.
Pub. info.: Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA.  pp.401-,  1995.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 386
25.

Conference Proceedings
Conference Proceedings
25. EVOLUTION OF Si SURFACES AFTER ANHYDROUS HF:CH3OH ETCHING
Torek, K. ; Miechkowski, A. ; Ruzyllo, J.
Pub. info.: Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.208-213,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-20
26.

Conference Proceedings
Conference Proceedings
26. MONITORING OF SILICON SURFACE AFTER REACTIVE ION ETCHING
Hwang, D.K. ; Ruzyllo, J. ; Kamieniecki, E.
Pub. info.: Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.184-193,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-20
27.

Conference Proceedings
Conference Proceedings
27. Mist deposition of thin photoresist films
Mahoney, W.J. ; Roman, P. ; Mumbauer, P. ; Ruzyllo, J.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.861-866,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376