1.

Conference Proceedings
Conference Proceedings
1. Feasibility of printing 0.1-ｦﾌm technology with optical lithography
Maenhoudt,M. ; Verhaegen,S. ; Ronse,K. ; Flagello,D.G. ; Geh,B. ; Kaiser,W.M.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.347-357,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
2.

Conference Proceedings
Conference Proceedings
2. CD control comparison of step-and-repeat versus step-and-scan DUV lithography for sub-0.25-ｦﾌm gate printing
Ronse,K. ; Maenhoudt,M. ; Marschner,T. ; Van,den,hove,L. ; Streefkerk,B. ; Finders,J. ; van,Schoot,J. ; Luehrmann,P.F. ; Minvielle,A.M.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.56-66,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
3.

Conference Proceedings
Conference Proceedings
3. Recent trends and progress in deep-UV lithography
Ronse,K. ; Goethals,A.M. ; Vandenberghe,G. ; Maenhoudt,M.
Pub. info.: Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland.  pp.34-39,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3741
4.

Conference Proceedings
Conference Proceedings
4. Status of ArF lithography for the 130-nm technology node
Ronse,K. ; Vandenberghe,G. ; Jaenen,P. ; Delvaux,C. ; Vangoidsenhoven,D. ; Roey,F.Van ; Pollers,I. ; Maenhoudt,M. ; Goethals,A.M. ; Pollentier,I.K. ; Vleeming,B. ; Schenau,K.van lngen ; Heskamp,B. ; Davies,G. ; Niroomand,A.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.410-422,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
5.

Conference Proceedings
Conference Proceedings
5. Limits of optical lithography
Maenhoudt,M. ; Verhaegen,S. ; Ronse,K. ; Zandbergen,P. ; Muzio,E.G.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.373-387,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
6.

Conference Proceedings
Conference Proceedings
6. Lithography aspects of dual-damascene interconnect technology
Maenhoudt,M. ; Goidsenhoven,D.Van ; Pollentier,I.K. ; Ronse,K. ; Lepage,M. ; Struyf,H. ; Hove,M.Van
Pub. info.: Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK.  pp.1-13,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4404
7.

Conference Proceedings
Conference Proceedings
7. NA/o optimization strategies for an advanced DUV stepper applied to 0.25-ｦﾌm and sub-0.25-ｦﾌm critical levels
Beeck,M.Op de ; Ronse,K. ; Ghandehari,K. ; Jaenen,P. ; Botermans,H. ; Finders,J. ; Lilygren,J.A. ; Baker,D.C. ; Vandenberghe,G. ; Bisschop,P.De ; Maenhoudt,M. ; hove,L.Van den
Pub. info.: Optical Microlithography X.  pp.320-332,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051