Brubaker, M. ; Staffa, J. ; Roman, P. ; Fakhouri, S. ; Ruzyllo, J.
Pub. info.:
Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. pp.408-414, 1997. Pennington, NJ. Electrochemical Society
Wu, C.T. ; Ridley, R. ; Dolny, G. ; Grebs, T. ; Hao, J. ; Suliman, S. ; Venkataraman, B. ; Awadelkarim, O. ; Williams, R. ; Roman, P. ; Ruzyllo, J.
Pub. info.:
Silicon Nitride and Silicon Dioxide Thin Insulating Films : proceedings of the sixth International Symposium. pp.127-133, 2001. Pennington, N.J.. Electrochemical Society
Roman, P. ; Kashkoush, I. ; Novak, R.E. ; Kamieniecki, E. ; Ruzyllo, J.
Pub. info.:
Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. pp.344-349, 1995. Pennington, NJ. Electrochemical Society
Roman, P. ; Tsai, C.-L. ; Hengstebeck, R. ; Pantano, C. ; Berry, J. ; Kamieniecki, E. ; Ruzyllo, J.
Pub. info.:
Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium. pp.145-149, 1999. Pennington, NJ. Electrochemical Society
Ridley, R. ; Wu, C.-T. ; Roman, P. ; Dolny, G. ; Grebs, T. ; Stensney, F. ; Ruzyllo, J.
Pub. info.:
Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium. pp.158-164, 1999. Pennington, NJ. Electrochemical Society
Lee, D. ; Roman, P. ; Mumbauer, P. ; Grant, R. ; Horn, M. ; Ruzyllo, J.
Pub. info.:
Low and high dielectric constant materials : materials science, processing, and reliability issues : proceedings of the fifth international symposium. pp.237-242, 2000. Pennington, N.J.. Electrochemical Society
Staffa, J. ; Fakhouri, S. ; Brubaker, M. ; Roman, P. ; Ruzyllo, J.
Pub. info.:
Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. pp.315-321, 1997. Pennington, NJ. Electrochemical Society
Roman, P. ; Lee, D. ; Mumbauer, P. ; Grant, R. ; Kamieniecki, E. ; Ruzyllo, J.
Pub. info.:
Low and high dielectric constant materials : materials science, processing, and reliability issues : proceedings of the fifth international symposium. pp.187-192, 2000. Pennington, N.J.. Electrochemical Society
Chang, K. ; Shanmugasundaram, K. ; Lee, D.-O. ; Roman, P. ; Shallenberger, J. ; Chang, F.-M. ; Wang, J. ; Beck, R. ; Mumbauer, P. ; Grant, R. ; Ruzyllo, J.
Pub. info.:
Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium. pp.78-85, 2003. Pennington, NJ. Electrochemical Society
Staffa, J. ; Roman, P. ; Chang, K. ; Torek, K. ; Ruzyllo, J.
Pub. info.:
Environmental, safety, and health issues in IC production : symposium held December 4-5, 1996, Boston, Massachusetts, U.S.A.. pp.9-, 1997. Pittsburgh, Pa.. MRS - Materials Research Society
Chang, K. ; Shallenberger, J. ; Chang, F.-M. ; Shanmugasundaram, K. ; Roman, P. ; Mumbauer, P. ; Ruzyllo, J.
Pub. info.:
Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium. pp.404-410, 2005. Pennington, NJ. Electrochemical Society
Roman, P. ; Lee, D.-O. ; Wang, J. ; Wu, C.-T. ; Subramanian, V. ; Brubaker, M. ; Mumbauer, P. ; Grant, R. ; Ruzyllo, J.
Pub. info.:
Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium. pp.241-248, 2001. Pennington, N.J.. Electrochemical Society
Le Roux, V. ; Machicoane, G. ; Borsoni, G. ; Korwin-Pawlowski, M. ; Bechu, N. ; Kerdiles, S. ; Laffitte, R. ; Valuer, L. ; Roman, P. ; Wu, C.-T. ; Ruzyllo, J.
Pub. info.:
Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium. pp.249-257, 2001. Pennington, N.J.. Electrochemical Society
Roman, P. ; Hwang, D. ; Torek, K. ; Ruzyllo, J. ; Kamieniecki, E.
Pub. info.:
Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA. pp.401-, 1995. Pittsburgh, PA. MRS - Materials Research Society
Roman, P. ; Lee, D.D. ; Wang, J. ; Mumbauer, P. ; Grant, R. ; Tower, J. ; Kamieniecki, E. ; Lukasiak, L. ; Ruzyllo, aud J.
Pub. info.:
Fundamental gas-phase and surface chemistry of vapor-phase deposition II and process control, diagnostics, and modeling in semiconductor manufacturing IV : proceedings of the international symposium. pp.207-212, 2001. Pennington, N.J.. Electrochemical Society