1.

Conference Proceedings
Conference Proceedings
1. THICKNESS DEPENDENT SENSITIVITY OF GATE OXIDES TO SURFACE CONTAMINATION
Ridley, R. ; Wu, C.-T. ; Roman, P. ; Dolny, G. ; Grebs, T. ; Stensney, F. ; Ruzyllo, J.
Pub. info.: Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium.  pp.158-164,  1999.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-36
2.

Conference Proceedings
Conference Proceedings
2. GAS-PHASE SURFACE CONDITIONING IN A HIGH-k GATE CLUSTER
Roman, P. ; Lee, D.-O. ; Wang, J. ; Wu, C.-T. ; Subramanian, V. ; Brubaker, M. ; Mumbauer, P. ; Grant, R. ; Ruzyllo, J.
Pub. info.: Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium.  pp.241-248,  2001.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2001-26
3.

Conference Proceedings
Conference Proceedings
3. ETCHING OF SILICON NATIVE OXIDE USING ULTR-SLOW MULTICHARGED Arq+ IONS
Le Roux, V. ; Machicoane, G. ; Borsoni, G. ; Korwin-Pawlowski, M. ; Bechu, N. ; Kerdiles, S. ; Laffitte, R. ; Valuer, L. ; Roman, P. ; Wu, C.-T. ; Ruzyllo, J.
Pub. info.: Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium.  pp.249-257,  2001.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2001-26