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ETCHING OF SILICON NATIVE OXIDE USING ULTR-SLOW MULTICHARGED Arq+ IONS

Author(s):
Le Roux, V.
Machicoane, G.
Borsoni, G.
Korwin-Pawlowski, M.
Bechu, N.
Kerdiles, S.
Laffitte, R.
Valuer, L.
Roman, P.
Wu, C.-T.
Ruzyllo, J.
6 more
Publication title:
Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2001-26
Pub. Year:
2001
Page(from):
249
Page(to):
257
Pages:
9
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773591 [1566773598]
Language:
English
Call no.:
E23400/200126
Type:
Conference Proceedings

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