1.

Conference Proceedings
Conference Proceedings
1. Reduced Pressure-Chemical Vapor Deposition of Ge Thick Layers on Si(001) for Microelectronics and Optoelectronics Purposes
Hartmann, J.M. ; Papon, A.M. ; Holliger, P. ; Rolland, G. ; Billon, T. ; Rouviere, M. ; Vivien, L. ; Laval, S.
Pub. info.: High-mobility group-IV materials and devices : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.147-152,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 809
2.

Conference Proceedings
Conference Proceedings
2. 38 Structural and Electrical Properties of CVD-WNx Thin Films Deposited on High-K Materials
Allegret, S. ; Rolland, G. ; Guidotti, E. ; Yamasaki, H. ; Holliger, P. ; Pierre, F. ; Martin, F.
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.324-330,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-05
3.

Conference Proceedings
Conference Proceedings
3. Analytical Characterization of Process Parameter Influence on the Initial Growth and Crystallinity of Atomic Layer Deposition HfO2 Thin Films
Blin, D. ; Rochat, N. ; Rolland, G. ; Holliger, P. ; Martin, F. ; Damlencourt, J.-F. ; Lardin, T. ; Besson, P. ; Haukka, S. ; Semeria, M.-N.
Pub. info.: Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah.  pp.233-242,  2003.  Pennington, NJ.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5133
4.

Conference Proceedings
Conference Proceedings
4. (9.4) 11:40 - 12:00 PM - High Ge Content Si/SiGe Heterostructures for Microelectronics and Optoelectronics Purposes
Bogumilowicz, Y. ; Hartmann, J.M. ; Damlencourt, J.F. ; Vandelle, B. ; Abbadie, A. ; Papon, A.-M. ; Rolland, G. ; Holliger, P. ; Di Nardo, C. ; Besson, P. ; Ernst, T. ; Billon, T. (CEA-LETI)
Pub. info.: SiGe: materials, processing, and devices : proceedings of the First international symposium.  pp.665-680,  2004.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-07
5.

Conference Proceedings
Conference Proceedings
5. Analytical Characterization of Process Parameter Influence on the Initial Growth and Crystallinity of Atomic Layer Deposition HfO2 Thin Films
Bun, D. ; Rochat, N. ; Rolland, G. ; Holliger, P. ; Martin, F. ; Damlencourt, J.-F. ; Lardin, T. ; Besson, P. ; Haukka, S. ; Semeria, M.-N.
Pub. info.: Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah.  pp.233-242,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-3