Scatterometry for Lithography Process Control and Characterization in IC Manufacturing
- Author(s):
- Publication title:
- Progress in semiconductor materials for optoelectronic applications : symposium held November 26-29, 2001, Boston, Massachusetts, U.S.A
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 692
- Pub. Year:
- 2002
- Page(from):
- 195
- Page(to):
- 202
- Pages:
- 8
- Pub. info.:
- Warrendale, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558996281 [1558996281]
- Language:
- English
- Call no.:
- M23500/692
- Type:
- Conference Proceedings
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