1.

Conference Proceedings
Conference Proceedings
1. Characterization of oxynitride hard mask removal processes for refractory x-ray mask fabrication
Brooks,C.J. ; Benoit,D.E. ; Racette,K.C. ; Puisto,D.M. ; Whig,R. ; Dauksher,W.J. ; Cummings,K.D.
Pub. info.: Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California.  pp.255-260,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3331
2.

Conference Proceedings
Conference Proceedings
2. Next-generation lithography mask development at the NGL Mask Center of Competency
Lercel,M.J. ; Brooks,C.J. ; Racette,K.C. ; Magg,C. ; Lawliss,M. ; Caldwell,N. ; Jeffer,R. ; Collins,K.W. ; Barrett,M. ; Nash,S.C. ; Trybendis,M.J. ; Bouchard,L.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.804-813,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
3.

Conference Proceedings
Conference Proceedings
3. Advanced refractory-metal and process technology for the fabrication of x-ray masks
Brooks,C.J. ; Racette,K.C. ; Lercel,M.J. ; Powers,L.A. ; Benoit,D.E.
Pub. info.: Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California.  Part1  pp.14-23,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3676