Pattern split rules! A feasibility study of rule based pitch decomposition for double patterning
- Author(s):
- A. van Oosten ( ASML Netherlands B.V., Netherlands )
- P. Nikolsky ( ASML Netherlands B.V., Netherlands )
- J. Huckabay ( Cadence Design Systems, USA )
- R. Goossens ( ASML MaskTools Inc., USA )
- R. Naber ( Cadence Design Systems, USA )
- Publication title:
- Photomask technology 2007
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6730
- Pub. Year:
- 2007
- Vol.:
- 1
- Page(from):
- 67301L-1
- Page(to):
- 67301L-7
- Pages:
- 7
- Pub. info.:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819468871 [0819468878]
- Language:
- English
- Call no.:
- P63600/6730
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Topological and model based approach to pitch decomposition for double patterning
Society of Photo-optical Instrumentation Engineers |
7
Conference Proceedings
30nm half-pitch metal patterning using Moti CD shrink technique and double patterning
Society of Photo-optical Instrumentation Engineers |
2
Conference Proceedings
Process results using automatic pitch decomposition and double patterning technology (DPT) at k1eff <0.20 [6349-36]
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
Society of Photo-optical Instrumentation Engineers |
Society of Photo-optical Instrumentation Engineers |
4
Conference Proceedings
Automatic pitch decomposition for improved process window when printing dense features at keff<0.20 [6283-102]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
5
Conference Proceedings
Application challenges with double patterning technology (DPT) beyond 45 nm [6349-75]
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
Pitch doubling through dual-patterning lithography challenges in integration and litho budgets
SPIE - The International Society of Optical Engineering |
6
Conference Proceedings
Preliminary methodology investigation of mask pattern fidelity for 250-nm design rules
Society of Photo-optical Instrumentation Engineers |
12
Conference Proceedings
Full-chip pitch/pattern splitting for lithography and spacer double patterning technologies
Society of Photo-optical Instrumentation Engineers |