1.

Conference Proceedings
Conference Proceedings
1. Top-surface imaging through silylation
Postnikov,S.V. ; Somervell,M.H. ; Henderson,C.L. ; Katz,S. ; Willson,C.G. ; Byers,J.D. ; Qin,A. ; Lin,Q.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 2  pp.997-1008,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
2.

Conference Proceedings
Conference Proceedings
2. Re-evaluating simple lambda-based design rules for low-K1 lithography process control
Postnikov,S.V. ; Lucas,K.D. ; Roman,B.J. ; Wimmer,K.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.901-912,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
3.

Conference Proceedings
Conference Proceedings
3. Study of acid transport using IR spectroscopy and SEM
Stewart,M.D. ; Somervell,M.H. ; Tran,H.V. ; Postnikov,S.V. ; Willson,C.G.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.665-674,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
4.

Conference Proceedings
Conference Proceedings
4. Mechanistic understanding of line-end shortening
Stewart,M.D. ; Schmid,G.M. ; Postnikov,S.V. ; Willson,C.G.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.10-18,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
5.

Conference Proceedings
Conference Proceedings
5. Impact of optimized illumination upon simple lambda-based design rules for low-K1 lithography
Postnikov,S.V. ; Lucas,K. ; Wimmer,K.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.797-808,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344