1.

Conference Proceedings
Conference Proceedings
1. Wave-optical considerations in photolithography
Wong, A.K. ; Pierrat, C.
Pub. info.: Wave-optical wywtems engineering II : 3-4 August 2003, San Diego, California, USA.  pp.63-72,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5182
2.

Conference Proceedings
Conference Proceedings
2. Pellicle-induced aberrations and apodization in hyper NA optical lithography [6283-115]
Bubke, K. ; Alles, B ; Cotte, E. ; Sczyrba, M. ; Pierrat, C.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.628318-628318,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
3.

Conference Proceedings
Conference Proceedings
3. Extending ArF to the 65-nm node with full-phase lithography
Driessen, F.A. ; Pierrat, C. ; Vandenberghe, G. ; Ronse, K.G. ; Adrichem, P. ; Liu, H.-Y.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.1091-1102,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
4.

Conference Proceedings
Conference Proceedings
4. Full phase-shifting methodology for 65-nm node lithography
Pierrat, C. ; Driessen, F.A.J.M. ; Vandenberghe, G.
Pub. info.: Optical Microlithography XVI.  Part One  pp.282-293,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
5.

Conference Proceedings
Conference Proceedings
5. The MEF revisited: low k1 effects versus mask topography effects
Pierrat, C. ; Wong, A.K.K.
Pub. info.: Optical Microlithography XVI.  Part One  pp.193-202,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
6.

Conference Proceedings
Conference Proceedings
6. Full phase-shifting methodology for 65-nm-node lithography
Pierrat, C.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.558-567,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
7.

Conference Proceedings
Conference Proceedings
7. New alternating phase-shifting mask conversion methodology using phase conflict resolution
Pierrat, C. ; Cote, M.L. ; Patterson, K.
Pub. info.: Optical Microlithography XV.  Part One  pp.325-335,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691