Blank Cover Image

Extending ArF to the 65-nm node with full-phase lithography

Author(s):
Driessen, F.A. ( Numerical Technologies, Inc. (USA) )
Pierrat, C. ( Numerical Technologies, Inc. (USA) )
Vandenberghe, G. ( IMEC (Belgium) )
Ronse, K.G. ( IMEC (Belgium) )
Adrichem, P. ( Numerical Technologies, Inc. (USA) )
Liu, H.-Y. ( Numerical Technologies, Inc. (USA) )
1 more
Publication title:
Optical Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5040
Pub. Year:
2003
Vol.:
Part Two
Page(from):
1091
Page(to):
1102
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
Language:
English
Call no.:
P63600/5040
Type:
Conference Proceedings

Similar Items:

Pierrat, C., Driessen, F.A.J.M., Vandenberghe, G.

SPIE-The International Society for Optical Engineering

Kim,Y.-C., Vandenberghe,G.N., Verhaegen,S., Ronse,K.

SPIE-The International Society for Optical Engineering

Driessen, F.A., Zawadzki, M.T., Krishnan, P.R., Balasinski, A., Vandenberghe, G.

SPIE - The International Society of Optical Engineering

Vandenberghe,G.N., Kim,Y.-C., Delvaux,C., Lucas,K.D., Choi,S.-J., Ercken,M., Ronse,K., Vleeming,B.

SPIE-The International Society for Optical Engineering

Driessen, F.A., van Adrichem, P., Philipsen, V., Jonckheere, R., Liu, H.-Y., Karklin, L.

SPIE-The International Society for Optical Engineering

Borodovsky, Y.A., Schenker, R.E., Allen, G.A., Tejnil, E., Hwang, D.H., Lo, F.-C., Singh, V.K., Gleason, R.E., …

SPIE-The International Society for Optical Engineering

Pierrat, C.

SPIE-The International Society for Optical Engineering

Ronse, K., Vandenberghe, G., Hendrickx, E., Leunissen, L. H. A., Aksenov, Y.

SPIE - The International Society of Optical Engineering

Ronse,K., Vandenberghe,G., Jaenen,P., Delvaux,C., Vangoidsenhoven,D., Roey,F.Van, Pollers,I., Maenhoudt,M., …

SPIE - The International Society for Optical Engineering

Montgomery, P.K., Vandenberghe, G., Lucas, K.

SPIE-The International Society for Optical Engineering

Vandenberghe,G.N., Driessen,F., Adrichem,P.J.van, Ronse,K., Li,J., Karklin,L.

SPIE-The International Society for Optical Engineering

12 Conference Proceedings 193-nm lithography on a full-field scanner

Goethals,A.-M., Pollers,I., Jaenen,P., Roey,F.Van, Ronse,K., Heskamp,B., Davies,G.

SPIE - The International Society for Optical Engineering

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12