1.

Conference Proceedings
Conference Proceedings
1. Analysis method to determine and characterize the mask mean-to-target and uniformity specification [6281-55]
Lee, -W. S. ; Leunissen, A. H. L. ; Van de Kerhove, J. ; Philipsen, V. ; Jonckheere, R. ; Lee, -J. S. ; Woo, -G. S. ; Cho, -K. H. ; Moon, -T. J.
Pub. info.: EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany.  pp.62810U-,  2006.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6281
2.

Conference Proceedings
Conference Proceedings
2. Through-pitch anf through-focus characterization of AAPSM for ArF immersion lithography [6281-53]
Konishi, T. ; Kojima, Y. ; Okuda, Y. ; Philipsen, V. ; Leunissen, A. H. L. ; Van Look, L.
Pub. info.: EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany.  pp.62810S-,  2006.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6281
3.

Conference Proceedings
Conference Proceedings
3. Manufacturability and printability of AAPSM with transparent etch stop layer [6281-54]
Cangemi, M. ; Philipsen, V. ; De Ruyter, R. ; Leunissen, L. ; Morgana, N. ; Sixt, P. ; Cangemi, M. ; Cottle, R. ; Kasprowicz, B.
Pub. info.: EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany.  pp.62810T-,  2006.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6281
4.

Conference Proceedings
Conference Proceedings
4. Determining the transfer function of a mask fabrication process
Leunissen, P. L. H. A. ; Philipsen, V. ; Jonckheere, R. M.
Pub. info.: 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.36-45,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5504
5.

Conference Proceedings
Conference Proceedings
5. OPC aware mask and wafer metrology
Maurer, W. ; Wiaux, V. ; Jonckheere, R.M. ; Philipsen, V. ; Hoffmann, T. ; Verhaegen, S. ; Ronse, K.G. ; England, J.G. ; Howard, W.B.
Pub. info.: 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.175-181,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4764
6.

Conference Proceedings
Conference Proceedings
6. Printability study with polarisation capable AIMS fab 193i to study polarisation effects [6152-92]
Zibold, A. ; Stroessner, U. ; Ridley, A. ; Scherubl, T. ; Rosenkranz, N. ; Harnisch, W. ; Poortinga, E. ; Schmid, R. ; Bekaert, J. ; Philipsen, V. ; Van Look, L.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XX.  pp.61522F-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6152
7.

Conference Proceedings
Conference Proceedings
7. Comparative study of bi-layer attenuating phase-shifting masks for hyper-NA lithography [6283-123]
Yoshizawa, M. ; Philipsen, V. ; Leunissen, A. H. L. ; Hendrickx, E. ; Jonckheere, R. ; Vandenberghe, G. ; Buttgereit, U. ; Becker, H. ; Koepernik, C. ; Irmscher, M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62831G-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
8.

Conference Proceedings
Conference Proceedings
8. Optimizing absorber thickness of attenuating phase-shifting masks for hyper-NA Iithogra phy [6154-51]
Yoshizawa, M. ; Philipsen, V. ; Leunissen, L. H. A.
Pub. info.: Optical Microlithography XIX.  pp.61541E-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
9.

Conference Proceedings
Conference Proceedings
9. Validity of the Hopkins approximation in simulations of hyper NA(NA>l) line-space structures for an attenuated PSM mask [6154-16]
Erdmann, A. ; Citarella, G. ; Evanschitzky, P. ; Schermer, H. ; Philipsen, V. ; De Bisschop, P.
Pub. info.: Optical Microlithography XIX.  pp.61540g-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
10.

Conference Proceedings
Conference Proceedings
10. Compensating mask topography effects in CPL through-pitch solutions toward the 45nm node [5992-61]
Bekaert, J. ; Philipsen, V. ; Vandenberghe, G. ; van den Broeke, D. ; Degel, W. ; Zibold, A.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59921O-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
11.

Conference Proceedings
Conference Proceedings
11. Advanced optical imaging platform for CD metrology and defect review on 130-nm to 100-nm node reticles: and overview of preliminary results
Hourd, A.C. ; Grimshaw, A. ; Scheuring, G. ; Gittinger, C. ; Brueck, H.-J. ; Chen, S.-B. ; Chen, P.W. ; Hartmann, H. ; Ordynskyy, V. ; Jonckheere, R.M. ; Philipsen, V. ; Schaetz, T. ; Sommer, K.
Pub. info.: 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.168-174,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4764
12.

Conference Proceedings
Conference Proceedings
12. Printability of hard and soft defects in 193-nm lithography
Philipsen, V. ; Jonckheere, R.M. ; Kohlpoth S. ; Friedrich, C.M. ; Torres, J.A.
Pub. info.: 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.95-111,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4764
13.

Conference Proceedings
Conference Proceedings
13. Implementation of 248-nm based CD metrology for advanced reticle production
Hourd, A.C. ; Grimshaw, A. ; Scheuring, G. ; Gittinger, C. ; Doebereiner, S. ; Hillmann, F. ; Brueck, H.-J. ; Hartmann, H. ; Ordynskyy, V. ; Peter, K. ; Chen, S.-B. ; Chen, P.W. ; Jonckheere, R.M. ; Philipsen, V. ; Schaetz, T. ; Sommer, K.
Pub. info.: 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.148-157,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5148
14.

Conference Proceedings
Conference Proceedings
14. Printability study for phase-shift masks at 193-nm lithography
Philipsen, V. ; Jonckheere, R.M.
Pub. info.: 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.79-89,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5148
15.

Conference Proceedings
Conference Proceedings
15. Through-pellicle-capable DUV-based CD metrology on reticles for wafer fab and R&D environment
Jonckheere, R.M. ; Philipsen, V. ; Scheuring, G. ; Hillmann, F. ; Brueck, H.-J. ; Ordynskyy, V. ; Peter, K. ; Hourd, A.C. ; Schaetz, T. ; Chen, S.-B. ; Chen, P.W. ; Sommer, K.
Pub. info.: 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.158-168,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5148
16.

Conference Proceedings
Conference Proceedings
16. Feature proximity errors on mask: assessment results of commercially obtained reticles
Jonckheere, R.M. ; Potoms, G. ; Philipsen, V.
Pub. info.: 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.128-137,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5148
17.

Conference Proceedings
Conference Proceedings
17. Feasibility study of embedded binary masks [6349-21]
Cangemi, M. ; Philipsen, V. ; Leunissen, L. H. A. ; Taylor, D.
Pub. info.: Photomask Technology 2006.  pp.63490L-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
18.

Conference Proceedings
Conference Proceedings
18. Reliable subnanometer repeatability for CD metrology in a reticle production environment
Hourd, A.C. ; Grimshaw, A. ; Scheuring, G. ; Gittinger, C. ; Doebereiner, S. ; Hillmann, F. ; Brueck, H.-J. ; Chen, S.-B. ; Chen, P.W. ; Jonckheere, R.M. ; Philipsen, V. ; Hartmann, M. ; Ordynskyy, V. ; Peter, K. ; Schaetz,T. ; Sommer, K.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.319-327,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
19.

Conference Proceedings
Conference Proceedings
19. Extended defect printability study for 100-nm design rule using 193-nm lithography
Philipsen, V. ; Jonckheere, R.M.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.509-519,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
20.

Conference Proceedings
Conference Proceedings
20. Defect printability for 100-nm design rule using 193-nm lithography
Philipsen, V. ; Jonckheere, R.M. ; Kohlpoth, S. ; Torres, A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.640-651,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
21.

Conference Proceedings
Conference Proceedings
21. Aerial image simulations of soft and phase defects in 193-nm lithography for 100-nm node
Driessen, F.A. ; van Adrichem, P. ; Philipsen, V. ; Jonckheere, R. ; Liu, H.-Y. ; Karklin, L.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1180-1189,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
22.

Conference Proceedings
Conference Proceedings
22. Assessment of OPC effectiveness using two-dimensional metrics
Wiaux, V. ; Philipsen, V. ; Jonckheere, R. ; Vandenberghe, G. ; Verhaegen, S. ; Hoffmann, T. ; Ronse, K. ; Howard, W.B. ; Maurer, W. ; Preil, M.E.
Pub. info.: Optical Microlithography XV.  Part One  pp.395-406,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
23.

Conference Proceedings
Conference Proceedings
23. Printability of 2D mask quality
Philipsen, V. ; Jonckheere, R.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.276-286,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
24.

Conference Proceedings
Conference Proceedings
24. Impact of the absorber thickness variation on the imaging performance of ArF immersion lithography [5853-112]
Yoshizawa, M. ; Philipsen, V. ; Leunissen, L. H. A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.243-251,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
25.

Conference Proceedings
Conference Proceedings
25. Through-pitch characterization and printability for 65nm half-pitch alternating aperture phase shift applications [5853-108]
Philipsen, V. ; Leunissen, L. ; De Ruyter, R. ; Jonckheere, R. ; Marlin, P. ; Wakefield, C. ; Johnson, S. ; Cangemi, M. ; Buxbaum, A. ; Morrison, T.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.211-222,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
26.

Conference Proceedings
Conference Proceedings
26. Printability of topography in alternating aperture phase-shift masks
Philipsen, V.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.587-595,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
27.

Conference Proceedings
Conference Proceedings
27. Mask topography effect in chromeless phase lithography
Philipsen, V. ; Bekaert, J. ; Vandenberghe, G. ; Jonckheere, R. ; Van Den Broeke, D. ; Socha, R.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.669-679,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567