Inductively Coupled Plasma Etching of III-Nitrides in Cl2/Xe, Cl2/Ar and Cl2/He
- Author(s):
Cho, H. Hahn, Y. B. Hays, D. C. Jung, K. B. Donovan, S. M. Abernathy, C. R. Pearton, S. J. Shul, R. J. - Publication title:
- GaN and related alloys : symposium held November 30-December 4, 1998, Boston, Massachusetts, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 537
- Pub. Year:
- 1999
- Page(from):
- G6.56.1
- Pub. info.:
- Warrendale, Pa.: MRS - Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558994430 [1558994432]
- Language:
- English
- Call no.:
- M23500/537
- Type:
- Conference Proceedings
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