HI/H2 ECR PLASMA ETCHING OF III-V SEMICONDUCTORS
- Author(s):
Pearton, S. J. Chakrabarti, U. K. Katz, A. Ren, F. Fullowan, T. R. Abernathy, C R. Hobson, W. S. - Publication title:
- Materials modification by energetic atoms and ions : symposium held April 28-30, 1992, San Francisco, California, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 268
- Pub. Year:
- 1992
- Page(from):
- 17
- Page(to):
- 22
- Pages:
- 6
- Pub. info.:
- Pittsburgh, PA: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558991637 [1558991638]
- Language:
- English
- Call no.:
- M23500/268
- Type:
- Conference Proceedings
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