1.

Conference Proceedings
Conference Proceedings
1. Reticle enhancement verification for the 65nm and 45nm nodes [6156-58]
Lucas, K. ; Patterson, K. ; Boone, R. ; Miramond, C. ; Borjon, A. ; Belledent, J. ; Toublan, O. ; Entradas, J. ; Trouiller, Y.
Pub. info.: Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA.  pp.61560R-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6156
2.

Conference Proceedings
Conference Proceedings
2. 65nm OPC and design optimization by using simple electrical transistor simulation
Trouiller, Y. ; Devoivre, T. ; Belledent, J. ; Foussadier, F. ; Borjon, A. ; Patterson, K. ; Lucas, K. ; Couderc, C. ; Sundermann, F. ; Urbani, J. -C. ; Baron, S. ; Rody, Y. ; Chapon, J. -D. ; Arnaud, F. ; Entradas, J.
Pub. info.: Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA.  pp.378-388,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5756
3.

Conference Proceedings
Conference Proceedings
3. Improving model-based OPC performance for the 65-nm node through calibration set optimization
Patterson, K. ; Trouiller, Y. ; Lucas, K. ; Belledent, J. ; Borjon, A. ; Rody, Y. ; Couderc, C. ; Sundermann, F. ; Urbani, J. -C. ; Baron, S.
Pub. info.: Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA.  pp.294-301,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5756
4.

Conference Proceedings
Conference Proceedings
4. Hydrothermal Oxidation of Organic Compounds by Nitrate and Nitrite
Dell'Orco, P. ; Foy, B. ; Wilmanns, E. ; Le, L. ; Ely, J. ; Patterson, K. ; Buelow, S.
Pub. info.: Innovations in supercritical fluids : science and technology : developed from a symposium held at the American Institute of Chemical Engineers Annual Meeting, San Francisco, California, November 13-18, 1994.  pp.179-,  1995.  Washington, DC.  American Chemical Society
Title of ser.: ACS symposium series
Ser. no.: 608
5.

Conference Proceedings
Conference Proceedings
5. Investigation of model-based physical design restrictions(Invited Paper)
Lucas, K. ; Baron, S. ; Belledent, J. ; Boone, R. ; Borjon, A. ; Couderc, C. ; Patterson, K. ; Riviere-Cazaux, L. ; Rody, Y. ; Sundermann, F. ; Toublan, O. ; Trouiller, Y. ; Urbani, J. -C. ; Wimmer, K.
Pub. info.: Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA.  pp.85-96,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5756
6.

Conference Proceedings
Conference Proceedings
6. Modeling of electromagnetic effects from mask topography at full-chip scale
Borjon, A. ; Belledent, J. ; Shang, S. D. ; Toublan, O. ; Miramond, C. ; Patterson, K. ; Lucas, K. ; Couderc, C. ; Rody, Y. ; Sundermann, F. ; Urbani, J.-C. ; Baron, S. ; Trouiller, Y. ; Schiavone, P.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.498-505,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
7.

Conference Proceedings
Conference Proceedings
7. Assessment of complementary double dipole lithography for 45 nm and 32 nm technologies
Postnikov, S. V. ; Robert, E. ; Thony, P. ; Patterson, K. ; Warrick, S. ; Henry, D. ; Torres, A. ; Toublon, O.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1478-1484,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
8.

Conference Proceedings
Conference Proceedings
8. Closing the defect printability loop: optimizing defect specifications for an established lithographic process
Patterson, K. ; Wakefield, C. ; Sixt, P. ; Sundermann, F. ; Trouiller, Y. ; Belledent, J. ; Couderc, C. ; Rody, Y. ; Lucas, K.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.1076-1082,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
9.

Conference Proceedings
Conference Proceedings
9. Evaluation of transparent etch stop layer phase shift mask patterning and comparison with the single trench undercut approach [5992-28]
Rody, Y. ; Martin, P. ; Couderc, C. ; Sixt, P. ; Gardin, C. ; Lucas, K. ; Patterson, K. ; Miramond-Collet, C. ; Belledent, J. ; Boone, R. ; Borjon, A. ; Trouiller, Y.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59920R-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
10.

Conference Proceedings
Conference Proceedings
10. Through-process window resist modelling strategies for the 65 nm node [5992-46]
Borjon, A. ; Belledent, J. ; Troullier, Y. ; Patterson, K. ; Lucas, K. ; Couderc, C. ; Sundermann, F. ; Urbani, J. -C. ; Baron, S. ; Rody, Y. ; Gardin, C. ; Foussadier, F. ; Schiavone, P.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.599219-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
11.

Conference Proceedings
Conference Proceedings
11. Line-edge roughness reduction and CD slimming using hardback processing
Peters, R.D. ; Lucas, K. ; Cobb, J.L. ; Parker, C. ; Patterson, K. ; McCauley, R. ; Ercken, M. ; Roey, F.V. ; Vandenbroeck, N. ; Pollentier, I.K.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  2  pp.1131-1142,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
12.

Conference Proceedings
Conference Proceedings
12. Effect of quartz phase etch on 193-nm alternating phase-shift mask performance for the 100- nm node
Patterson, K. ; Litt, L.C. ; Maltabes, J.G. ; Hughes, G.P. ; Robertson, T. ; Montgomery, B.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1033-1040,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
13.

Conference Proceedings
Conference Proceedings
13. MEV as a new constraint for lithographers in the sub-100-nm regime
Trouiller, Y. ; Postnikov, S.V. ; Lucas, K.D. ; Sundermann, F. ; Patterson, K. ; Belledent, J. ; Couderc, C. ; Rody, Y.F.
Pub. info.: Optical Microlithography XVII.  pp.1081-1092,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
14.

Conference Proceedings
Conference Proceedings
14. Critical failure ORC: application to the 90-nm and 65-nm nodes
Belledent, J. ; Shang, S.D. ; Trouiller, Y. ; Miramond, C. ; Patterson, K. ; Toublan, O.R. ; Couderc, C. ; Sundermann, F. ; Rody, Y.F.
Pub. info.: Optical Microlithography XVII.  pp.1184-1197,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
15.

Conference Proceedings
Conference Proceedings
15. Correction of long-range effects applied to the 65-nm node [5853-107]
Belledent, J. ; Word, J. ; Trouiller, Y. ; Couderc, C. ; Miramond, C. ; Toublan, O. ; Chapon, J.-D. ; Baron, S. ; Borjon, A. ; Foussadier, F. ; Gardin, C. ; Lucas, K. ; Patterson, K. ; Rody, Y. ; Sundermann, F.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.202-210,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
16.

Conference Proceedings
Conference Proceedings
16. Dual layer patterning failures in complex RET processes using ORC tools and pre- or post-optical proximity correction strategy [5853-100]
Couderc, C. ; Belledent, J. ; Borjon, A. ; Trouiller, Y. ; Sundermann, F. ; Lucas, K. ; Urbani, J.C. ; Foussadier, F. ; Rody, Y. ; Patterson, K. ; Baron, S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.141-151,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
17.

Conference Proceedings
Conference Proceedings
17. New alternating phase-shifting mask conversion methodology using phase conflict resolution
Pierrat, C. ; Cote, M.L. ; Patterson, K.
Pub. info.: Optical Microlithography XV.  Part One  pp.325-335,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
18.

Conference Proceedings
Conference Proceedings
18. Model-based design improvements for the 100-nm lithography generation
Lucas, K. ; Postnikov, S.V. ; Patterson, K. ; Yuan, C.-M. ; Thomas, C. ; Thompson, M.A. ; Carter, R. ; Litt, L.C. ; Montgomery, P.K. ; Wimmer, K.
Pub. info.: Optical Microlithography XV.  Part One  pp.215-226,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691