1.

Conference Proceedings
Conference Proceedings
1. Novel single-layer photoresist containing cycloolefins for 193 nm
Park,J.-H. ; Seo,D.-C. ; Kim,K.-D. ; Park,S.-Y. ; Kim,S.-J. ; Lee,H. ; Jung,J.-C. ; Bok,C.-K. ; Baik,K.-H.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.454-462,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
2.

Conference Proceedings
Conference Proceedings
2. ArF photoresist system using alicyclic polymer
Park,J.-H. ; Kim,S.-J. ; Park,S.-Y. ; Lee,H. ; Jung,J.-C. ; Bok,C.-K. ; Baik,K.-H.
Pub. info.: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.485-491,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3049
3.

Conference Proceedings
Conference Proceedings
3. Terpolymer of maleic anhydride and cycloolefin derivatives as an ArF photoresist
Kim,S.-J. ; Park,J.-H. ; Kim,J.-H. ; Kim,K.-D. ; Lee,H. ; Jung,J.-C. ; Bok,C.-K. ; Baik,K.-H.
Pub. info.: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.430-436,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3049
4.

Conference Proceedings
Conference Proceedings
4. Chemically amplified negative-tone deep-UV photoresist based on poly(alkoxy styrenes)containing acetal groups
Park,J.-H. ; Kim,S.-J. ; Kim,J.-H. ; Seo,D.-C. ; Kim,K.-D. ; Park,S.-Y. ; Lee,H.
Pub. info.: Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California.  pp.287-295,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2724
5.

Conference Proceedings
Conference Proceedings
5. Materials design and lithographic performance of maleic anhydride/cycloolefin copolymer for ArF resist
Park,J.-H. ; Kim,J.-Y. ; Seo,D.-C. ; Park,S.-Y. ; Lee,H. ; Kim,S.-J. ; Jung,J.-C. ; Baik,K.-H.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.1163-1170,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999