1.

Technical Paper
Technical Paper
1. High-fidelity Simulation-based Optimum Design Utilizing Computing Grid Technology
Park, J. ; Park, S. ; Moon, J. ; Yoon, Y. ; Kim, S.
Pub. info.: AIAA meeting papers on disc.  2005.  [Reston, Va.].  American Institute of Aeronautics and Astronautics
Title of ser.: AIAA Paper : AIAA/ASME/ASCE/AHS/ASC Structures, Structural Dynamics, and Materials Conference
Ser. no.: 46th
2.

Technical Paper
Technical Paper
2. Morphing Technique Application for the Automotive Component Analysis.
Ko, C. ; Park, J. ; Park, K. ; Park, S.
Pub. info.: 25th Annual Brake Colloquium & Exhibition : SAE technical paper.  2007.  Warrendale, Penn..  Society of Automotive Engineers
Title of ser.: Society of Automotive Engineers technical paper series
Ser. no.: 2007
3.

Conference Proceedings
Conference Proceedings
3. Precision process calibration and CD predictions for low-k1 lithography [5853-64]
Chen, T. ; Park, S. ; Berger, G. ; Coskun, T. H. ; de Vocht, J. ; Chen, F. ; Yu, L. ; Hsu, S. ; van den Broeke, D. ; Socha, R. ; Park, J. ; Gronlund, K. ; Davis, T. ; Plachecki, V. ; Harris, T. ; Hansen, S. ; Lambson, C.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.785-799,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
4.

Conference Proceedings
Conference Proceedings
4. Patterning optimization for 55nm design rule DRAM/flash memory using production-ready customized illuminations [5992-110]
Chen, T. ; Van Den Broeke, D. ; Hsu, S. ; Park, S. ; Berger, G. ; Coskun, T. ; de Vocht, J. ; Chen, F. ; Socha, R. ; Park, J. ; Gronlund, K.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.599239-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
5.

Conference Proceedings
Conference Proceedings
5. RET masks for the final frontier of optical lithography [5853-104]
Chen, J. F. ; Broeke, D. van den ; Hsu, S. ; Hsu, M. C.W. ; Laidig, T. ; Shi, X. ; Chen, T. ; Socha, R. J. ; Hollerbach, U. ; Wampler, K. E. ; Park, J. ; Park, S. ; Gronlund, K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.168-179,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853