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EUV mask process development and integration [6283-91]

Author(s):
Zhang, G.
Yan, -Y. P.
Liang, T.
Du, Y.
Sanchez, P.
Park, S.
Lanzendorf, J. E.
Choi, J. C.
Shu, Y. E.
Stivers, R. A.
Farnsworth, J.
Hsia, K.
Chandhok, M.
Leeson, J. M.
Vandentop, G. ( Intel Corp. (USA) )
10 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6283
Pub. Year:
2006
Pt.:
1
Page(from):
62830G
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819463586 [0819463582]
Language:
English
Call no.:
P63600/6283
Type:
Conference Proceedings

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