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RET masks for the final frontier of optical lithography [5853-104]

Author(s):
Chen, J. F.
Broeke, D. van den
Hsu, S.
Hsu, M. C.W.
Laidig, T.
Shi, X.
Chen, T. ( ASML MaskTools (USA) )
Socha, R. J. ( ASML TDC (USA) )
Hollerbach, U.
Wampler, K. E.
Park, J.
Park, S.
Gronlund, K. ( ASML MaskTools (USA) )
8 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5853
Pub. Year:
2005
Pt.:
1
Page(from):
168
Page(to):
179
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819458537 [0819458538]
Language:
English
Call no.:
P63600/5853
Type:
Conference Proceedings

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