1.

Conference Proceedings
Conference Proceedings
1. Simulation of resist heating effect with e-beam lithography using distributed processing (DP) [5853-18]
Ki, W.-T. ; Ahn, B.-S. ; Park, J.-S. ; Choi, S.-W. ; Ma, S.-B. ; Han, W.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.416-424,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
2.

Conference Proceedings
Conference Proceedings
2. The application of phase grating to CLM technology for the sub-65nm node optical lithography [5853-55]
Yoon, G.-S. ; Kim, S.-H. ; Park, J.-S. ; Choi, S.-Y. ; Jean, C.-U. ; Shin, I.-K. ; Choi, S.-W. ; Han, W.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.703-713,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
3.

Conference Proceedings
Conference Proceedings
3. ArF issues of 90-nm-node DRAM device integration
Goo, D.-H. ; Kim, B.-S. ; Park, J.-S. ; Yoon, K.-S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Optical Microlithography XVI.  Part Three  pp.1296-1303,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
4.

Conference Proceedings
Conference Proceedings
4. Validation of ArF chromeless PSM in the sub-100-nm node DRAM cell
Lee, J.-H. ; Chung, D.-H. ; Cha, D.-C. ; Kim, H.-S. ; Park, J.-S. ; Nam, D.-G. ; Woo, S.-K. ; Cho, H.-S. ; Han, W.-S.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1253-1262,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
5.

Conference Proceedings
Conference Proceedings
5. Study of Cr patch validity for ArF CPL mask and its fabrication
Kim, C.-H. ; Kim, S.-H. ; Lee, M.-S. ; Park, J.-S. ; Shin, I.-G. ; Choi, S.-W. ; Yoon, H.-S. ; Han, W.-S.
Pub. info.: Optical Microlithography XVII.  pp.1247-1254,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377