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Conference Proceedings

1. Simulation of resist heating effect with e-beam lithography using distributed processing (DP) [5853-18]

Ki, W.-T. ; Ahn, B.-S. ; Park, J.-S. ; Choi, S.-W. ; Ma, S.-B. ; Han, W.-S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XII. pp.416-424, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5853

Conference Proceedings

2. The application of phase grating to CLM technology for the sub-65nm node optical lithography [5853-55]

Yoon, G.-S. ; Kim, S.-H. ; Park, J.-S. ; Choi, S.-Y. ; Jean, C.-U. ; Shin, I.-K. ; Choi, S.-W. ; Han, W.-S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XII. pp.703-713, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5853

Conference Proceedings

3. Full-chip application for SRAM gate at 100-nm node and beyond using chromeless phase lithography

Park, J.-S. ; Kim, S.-H. ; Shin, I.-K. ; Choi, S.-W. ; Sohn, J.-M. ; Lee, J.-H. ; Shin, H.-S. ; Laidig, T.L. ; Van den Broeke, D.J. ; Chen, J.F.

Pub. info.:	23rd Annual BACUS Symposium on Photomask Technology. pp.112-121, 2003. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5256

Conference Proceedings

4. Study of Cr patch validity for ArF CPL mask and its fabrication

Kim, C.-H. ; Kim, S.-H. ; Lee, M.-S. ; Park, J.-S. ; Shin, I.-G. ; Choi, S.-W. ; Yoon, H.-S. ; Han, W.-S.

Pub. info.:	Optical Microlithography XVII. pp.1247-1254, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5377