1.

Conference Proceedings
Conference Proceedings
1. Characterization, modeling, and impact of scattered light in low-k1 lithography
Park, E.-S. ; Cho, H.-J. ; Kim, J, -M. ; Choi, S.-S.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.285-293,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. A new method for correcting proximity and fogging effects by using the EID model of variable shaped beam for 65-nm node [5853-07]
Park, E.-S. ; Cho, H.-J. ; Kim, J.-M. ; Choi, S.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.58-65,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
3.

Conference Proceedings
Conference Proceedings
3. Modeling and correction of global CD uniformity caused by fogging and loading effects in 90-nm-node CAR process
Park, D.-I. ; Park, E.-S. ; Lee, J.-H. ; Jeong, W.-G. ; Seo, S.-K. ; Kwon, H.-J. ; Kim, J.-M. ; Jung, S.-M. ; Choi, S.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.78-85,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
4.

Conference Proceedings
Conference Proceedings
4. Comparative evaluation of mask production CAR development processes with stepwise defect inspection
Jeong, W.-G. ; Lee, J.-K. ; Park, D.I. ; Park, E.-S. ; Lee, J.-H. ; Seo, S.-K. ; Lee, D.-H. ; Kim, J.-M. ; Choi, S.S. ; Jeong, S.H.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.626-633,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
5.

Conference Proceedings
Conference Proceedings
5. 90-nm-node CD uniformity improvement using a controlled gradient temperature CAR PEB process
Park, D.-I. ; Seo, S.-K. ; Park, E.-S. ; Lee, J.-H. ; Jeong, W.-G. ; Kim, J.-M. ; Choi, S.-S. ; Jeong, S.-H.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.634-640,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
6.

Conference Proceedings
Conference Proceedings
6. Comparative evaluation of mask cleaning performance
Jeong, W.-G. ; Park, D.- ; Park, E.-S. ; Cho, Y.-W. ; Choi, S.-J. ; Kwon, H.-J. ; Kim, J.-M. ; Choi, S.-S.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.510-517,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
7.

Conference Proceedings
Conference Proceedings
7. Comparative evaluation of positive and negative chemically amplified resist characteristics for 90-nm-node photomask production
Jeong, W.-G. ; Park, D.-I. ; Park, E.-S. ; Seo, S.-K. ; Kwon, H.-J. ; Kim, J.-M. ; Jung, S.-M. ; Choi, S.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.157-167,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
8.

Conference Proceedings
Conference Proceedings
8. The feasibility study of thin Cr film for low process bias
Seo, W.-W. ; Yoon, S.-Y. ; Park, D.-I. ; Park, E.-S. ; Kim, J.-M. ; Jeong, S.-M. ; Choi, S.-S. ; Cha, H.-S. ; Nam, K.S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.136-143,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
9.

Conference Proceedings
Conference Proceedings
9. A study of post-exposure baking effect for CAR process in photomask fabrication
Park, D.-I. ; Seo, S.-K. ; Jeong, W.-G. ; Park, E.-S. ; Lee, J.-H. ; Kwon, H.-J. ; Kim, J.-M. ; Jung, S.-M. ; Choi, S.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.190-196,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130