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Improved overlay control through automated high order compensation

Author(s):
S. Wakamoto ( Nikon Corp. (Japan) )
Y. Ishii ( Nikon Corp. (Japan) )
K. Yasukawa ( Nikon Corp. (Japan) )
A. Sukegawa ( Nikon Corp. (Japan) )
S. Maejima ( Renesas Technology Corp. (Japan) )
A. Kato ( KLA-Tencor Japan, Ltd. (Japan) )
J. C. Robinson ( KLA-Tencor Corp. (USA) )
B. J. Eichelberger ( KLA-Tencor Corp. (USA) )
P. Izikson ( KLA-Tencor Corp. (Israel) )
M. Adel ( KLA-Tencor Corp. (Israel) )
5 more
Publication title:
Metrology, inspection, and process control for microlithography XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6518
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466372 [0819466379]
Language:
English
Call no.:
P63600/6518
Type:
Conference Proceedings

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